Inventor
TADA KUNIHIRO
JP19 patents
⚠️ This page may combine multiple inventors who share the name “TADA KUNIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS5709757AJan 20, 1998
Film forming and dry cleaning apparatus and method
TOKYO ELECTRON LTD160 citations99
US6919273B1Jul 19, 2005
Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film
TOKYO ELECTRON LTD21 citations92
US6537621B1Mar 25, 2003
Method of forming a titanium film and a barrier film on a surface of a substrate through lamination
TOKYO ELECTRON LTD20 citations92
US6051281AApr 18, 2000
Method of forming a titanium film and a barrier metal film on a surface of a substrate through lamination
TOKYO ELECTRON LTD33 citations92
US5942282AAug 24, 1999
Method for depositing a titanium film
TOKYO ELECTRON LTD36 citations92
US6197674B1Mar 6, 2001
CVD-Ti film forming method
TOKYO ELECTRON LTD12 citations74
US6069093AMay 30, 2000
Process of forming metal films and multi layer structure
TOKYO ELECTRON LTD9 citations74
US7484513B2Feb 3, 2009
Method of forming titanium film by CVD
TOKYO ELECTRON LTD6 citations73
US7153773B2Dec 26, 2006
TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system
TOKYO ELECTRON LTD9 citations73
US6841203B2Jan 11, 2005
Method of forming titanium film by CVD
TOKYO ELECTRON LTD5 citations73
US6451388B1Sep 17, 2002
Method of forming titanium film by chemical vapor deposition
TOKYO ELECTRON LTD12 citations73
US6177149B1Jan 23, 2001
Method of forming titanium film by CVD
TOKYO ELECTRON LTD13 citations73
US6004872ADec 21, 1999
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD8 citations73
US7737005B2Jun 15, 2010
Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program
TOKYO ELECTRON LTD6 citations62
US10815567B2Oct 27, 2020
Deposition device and deposition method
TOKYO ELECTRON LTD0 citations41