Inventor
RIUS JEAN-MICHEL
FR13 patents
⚠️ This page may combine multiple inventors who share the name “RIUS JEAN-MICHEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SIDEL SA
6 patentsUS4836971AJun 6, 1989
Method for manufacturing heat resistant PET containers
SIDEL SA82 citations95
US6919114B1Jul 19, 2005
Container with material coating having barrier effect and method and apparatus for making same
SIDEL SA94 citations94
US6328805B1Dec 11, 2001
Equipment for processing a container using a low-pressure plasma having an improved vacuum circuit
SIDEL SA42 citations92
US4846656AJul 11, 1989
Apparatus for heat treatment of preform necks
SIDEL SA42 citations92
US6818068B1Nov 16, 2004
Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit
SIDEL SA27 citations90
US6827972B2Dec 7, 2004
Container with a coating of barrier effect material, and method and apparatus for manufacturing the same
SIDEL SA41 citations89
SIDEL PARTICIPATIONS
5 patentsUS7975646B2Jul 12, 2011
Device for depositing a coating on an internal surface of a container
SIDEL PARTICIPATIONS41 citations91
US7887891B2Feb 15, 2011
Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve
SIDEL PARTICIPATIONS16 citations83
US7678430B2Mar 16, 2010
Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
SIDEL PARTICIPATIONS1 citations48
US8382904B2Feb 26, 2013
Gas feed installation for machines depositing a barrier layer on containers
SIDEL PARTICIPATIONS0 citations41
US8020513B2Sep 20, 2011
Cooled device for plasma depositing a barrier layer onto a container
SIDEL PARTICIPATIONS0 citations41
RIUS JEAN-MICHEL
2 patentsUS9279180B2Mar 8, 2016
Machine for plasma treatment of containers comprising an integrated vacuum circuit
RIUS JEAN-MICHEL1 citations46
US8826853B2Sep 9, 2014
Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
RIUS JEAN-MICHEL0 citations36