Inventor
DURHAM DANA L
US27 patents
⚠️ This page may combine multiple inventors who share the name “DURHAM DANA L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST CELANESE CORP
15 patentsUS5516886AMay 14, 1996
Metal ion reduction in top anti-reflective coatings for photoresists
HOECHST CELANESE CORP21 citations93
US5286606AFeb 15, 1994
Process for producing a developer having a low metal ion level
HOECHST CELANESE CORP32 citations93
US5688893ANov 18, 1997
Method of using a Lewis base to control molecular weight of novolak resins
HOECHST CELANESE CORP18 citations92
US5652317AJul 29, 1997
Antireflective coatings for photoresist compositions
HOECHST CELANESE CORP28 citations92
US5652297AJul 29, 1997
Aqueous antireflective coatings for photoresist compositions
HOECHST CELANESE CORP38 citations92
US5476750ADec 19, 1995
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
HOECHST CELANESE CORP32 citations92
US5374693ADec 20, 1994
Novolak resin blends for photoresist applications
HOECHST CELANESE CORP16 citations82
US5624789AApr 29, 1997
Metal ion reduction in top anti-reflective coatings for photoresisis
HOECHST CELANESE CORP14 citations74
US5543263AAug 6, 1996
Photoresist having a low level of metal ions
HOECHST CELANESE CORP16 citations74
US5646218AJul 8, 1997
Novolak resin blends for photoresist applications
HOECHST CELANESE CORP7 citations73
US5665517ASep 9, 1997
Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
HOECHST CELANESE CORP15 citations71
US5594098AJan 14, 1997
Metal ion reduction in novolak resins and photoresists
HOECHST CELANESE CORP3 citations63
US5248585ASep 28, 1993
Polyphosphazene binder resins for photoresists comprising as photosensitizers o-quinone diazide esters
HOECHST CELANESE CORP5 citations57
US5614349AMar 25, 1997
Using a Lewis base to control molecular weight of novolak resins
HOECHST CELANESE CORP1 citations52
US5580949ADec 3, 1996
Metal ion reduction in novolak resins and photoresists
HOECHST CELANESE CORP1 citations52
CLARIANT FINANCE BVI LTD
8 patentsUS5981145ANov 9, 1999
Light absorbing polymers
CLARIANT FINANCE BVI LTD59 citations96
US5733714AMar 31, 1998
Antireflective coating for photoresist compositions
CLARIANT FINANCE BVI LTD78 citations95
US5994430ANov 30, 1999
Antireflective coating compositions for photoresist compositions and use thereof
CLARIANT FINANCE BVI LTD42 citations92
US6187506B1Feb 13, 2001
Antireflective coating for photoresist compositions
CLARIANT FINANCE BVI LTD38 citations90
US6368421B1Apr 9, 2002
Composition for stripping photoresist and organic materials from substrate surfaces
CLARIANT FINANCE BVI LTD24 citations88
US6106995AAug 22, 2000
Antireflective coating material for photoresists
CLARIANT FINANCE BVI LTD14 citations74
US5876897AMar 2, 1999
Positive photoresists containing novel photoactive compounds
CLARIANT FINANCE BVI LTD9 citations74
US5866295AFeb 2, 1999
Photosensitive quinolone compounds and a process of preparation
CLARIANT FINANCE BVI LTD3 citations63
AIR PROD & CHEM
4 patentsUS6677286B1Jan 13, 2004
Compositions for removing etching residue and use thereof
AIR PROD & CHEM54 citations94
US6821352B2Nov 23, 2004
Compositions for removing etching residue and use thereof
AIR PROD & CHEM29 citations90
US6951710B2Oct 4, 2005
Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
AIR PROD & CHEM39 citations89
US7687447B2Mar 30, 2010
Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid
AIR PROD & CHEM11 citations83