Inventor
MUELLENDER STEPHAN
DE17 patents
⚠️ This page may combine multiple inventors who share the name “MUELLENDER STEPHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
8 patentsUS8382301B2Feb 26, 2013
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
ZEISS CARL SMT GMBH18 citations91
US8585224B2Nov 19, 2013
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
ZEISS CARL SMT GMBH11 citations82
US9996005B2Jun 12, 2018
Reflective optical element and optical system for EUV lithography
ZEISS CARL SMT GMBH3 citations72
US9341958B2May 17, 2016
Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
ZEISS CARL SMT GMBH2 citations62
US9778576B2Oct 3, 2017
Microlithography illumination system and microlithography illumination optical unit
ZEISS CARL SMT GMBH1 citations52
US9720329B2Aug 1, 2017
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US9285515B2Mar 15, 2016
Imaging optical system and projection exposure system including the same
ZEISS CARL SMT GMBH0 citations47
US9606446B2Mar 28, 2017
Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
ZEISS CARL SMT GMBH0 citations40
ZEISS CARL SMT AG
3 patentsUS7646004B2Jan 12, 2010
Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
ZEISS CARL SMT AG2 citations58
US7763870B2Jul 27, 2010
Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements
ZEISS CARL SMT AG1 citations51
US7429116B2Sep 30, 2008
Projection objective and method for its manufacture
ZEISS CARL SMT AG1 citations51