P

Inventor

CHEN XI-ZONG

TW21 patents

Patents

21 patents
US11075279B2Jul 27, 2021

Metal gate and contact plug design and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10121873B2Nov 6, 2018

Metal gate and contact plug design and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9837539B1Dec 5, 2017

FinFET device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US10629480B2Apr 21, 2020

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10515817B2Dec 24, 2019

Method for forming features of semiconductor structure having reduced end-to-end spacing

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10153373B2Dec 11, 2018

FinFET device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11621263B2Apr 4, 2023

Semiconductor device with short-resistant capacitor plate

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12125748B2Oct 22, 2024

Contact plug

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11798846B2Oct 24, 2023

Contact plug

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11424364B2Aug 23, 2022

FinFET device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11211496B2Dec 28, 2021

FinFET device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11139174B2Oct 5, 2021

Method for forming features of semiconductor structure having reduced end-to-end spacing

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11022878B2Jun 1, 2021

Critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10495970B2Dec 3, 2019

Critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12453168B2Oct 21, 2025

Semiconductor device with short-resistant capacitor plate

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10985053B2Apr 20, 2021

Contact plugs and methods of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11049756B2Jun 29, 2021

Thermal pad for etch rate uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US10199252B2Feb 5, 2019

Thermal pad for etch rate uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US10879109B2Dec 29, 2020

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10727346B2Jul 28, 2020

FinFET device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10269624B2Apr 23, 2019

Contact plugs and methods of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48