P

Inventor

HSIEH SHANE

US20 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH SHANE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST CELANESE CORP

11 patents
US5008175AApr 16, 1991

Copying materials

HOECHST CELANESE CORP31 citations92
US4912021AMar 27, 1990

Developer-finisher compositions for lithographic plates

HOECHST CELANESE CORP22 citations81
US4873174AOct 10, 1989

Method of using developer-finisher compositions for lithographic plates

HOECHST CELANESE CORP21 citations81
US5084372AJan 28, 1992

Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound

HOECHST CELANESE CORP14 citations74
US5436112AJul 25, 1995

Method for producing a negative image with color proofing element containing a urethane monomer

HOECHST CELANESE CORP10 citations73
US4851324AJul 25, 1989

Phenoxy propanol containing developer compositions for lithographic plates having neutral pH

HOECHST CELANESE CORP18 citations73
US4786580ANov 22, 1988

Method of developing imaged diazo material with propanol containing developer composition

HOECHST CELANESE CORP8 citations73
US4783395ANov 8, 1988

Desensitizing solution for lithographic printing plates

HOECHST CELANESE CORP13 citations73
US4780396AOct 25, 1988

Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant

HOECHST CELANESE CORP9 citations73
US4980271ADec 25, 1990

Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate

HOECHST CELANESE CORP3 citations62
US4728597AMar 1, 1988

Desensitizing solution for lithographic printing plates

HOECHST CELANESE CORP2 citations62

HOECHST CO AMERICAN

3 patents

AGFA CORP

2 patents

HOECHST AG

2 patents

BAYER AG

1 patent

HOEHST CELANESE CORP

1 patent