Inventor
BUDINGER WILLIAM D
US30 patents
⚠️ This page may combine multiple inventors who share the name “BUDINGER WILLIAM D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RODEL INC
21 patentsUS6022264AFeb 8, 2000
Polishing pad and methods relating thereto
RODEL INC99 citations98
US6069080AMay 30, 2000
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC126 citations97
US5900164AMay 4, 1999
Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements
RODEL INC141 citations97
US5578362ANov 26, 1996
Polymeric polishing pad containing hollow polymeric microelements
RODEL INC433 citations97
US4927432AMay 22, 1990
Pad material for grinding, lapping and polishing
RODEL INC231 citations97
US6488570B1Dec 3, 2002
Method relating to a polishing system having a multi-phase polishing layer
RODEL INC68 citations96
US6375559B1Apr 23, 2002
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC61 citations96
US6210254B1Apr 3, 2001
Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)
RODEL INC45 citations96
US6099394AAug 8, 2000
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC82 citations96
US6036579AMar 14, 2000
Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto
RODEL INC82 citations96
US5932486AAug 3, 1999
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC83 citations96
US6439989B1Aug 27, 2002
Polymeric polishing pad having continuously regenerated work surface
RODEL INC39 citations95
US6517417B2Feb 11, 2003
Polishing pad with a transparent portion
RODEL INC38 citations93
US6375694B1Apr 23, 2002
Polishing slurry compositions capable of providing multi-modal particle packing
RODEL INC19 citations93
US6093649AJul 25, 2000
Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto
RODEL INC43 citations93
US6030899AFeb 29, 2000
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC21 citations93
US6337281B1Jan 8, 2002
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC44 citations92
US4198739AApr 22, 1980
Printing roller with polymeric coner and method of making the same
RODEL INC60 citations89
US6245679B1Jun 12, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC13 citations74
US6210525B1Apr 3, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC14 citations74
US6518188B2Feb 11, 2003
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC3 citations63
BUDINGER WILLIAM D
5 patentsUS4512113AApr 23, 1985
Workpiece holder for polishing operation
BUDINGER WILLIAM D623 citations98
US5016483AMay 21, 1991
Method and apparatus for determination and display of critical gas supply information
BUDINGER WILLIAM D22 citations92
US4876903AOct 31, 1989
Method and apparatus for determination and display of critical gas supply information
BUDINGER WILLIAM D50 citations92
US4970897ANov 20, 1990
Method and apparatus for determination and display of gas consumption time
BUDINGER WILLIAM D16 citations73
US4926703AMay 22, 1990
Method and apparatus for determination and display of critical gas supply information
BUDINGER WILLIAM D8 citations73
ROHM & HAAS ELECT MAT
3 patentsUS6899611B2May 31, 2005
Polishing pad for a semiconductor device having a dissolvable substance
ROHM & HAAS ELECT MAT32 citations95
US6860793B2Mar 1, 2005
Window portion with an adjusted rate of wear
ROHM & HAAS ELECT MAT43 citations91
US6903021B2Jun 7, 2005
Method of polishing a semiconductor device
ROHM & HAAS ELECT MAT6 citations72