Inventor
OTA TOSHIYUKI
KR23 patents
⚠️ This page may combine multiple inventors who share the name “OTA TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JAPAN SYNTHETIC RUBBER CO LTD
10 patentsUS5679495AOct 21, 1997
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD112 citations97
US5580695ADec 3, 1996
Chemically amplified resist
JAPAN SYNTHETIC RUBBER CO LTD58 citations96
US5556734ASep 17, 1996
Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate
JAPAN SYNTHETIC RUBBER CO LTD75 citations96
US5629135AMay 13, 1997
Chemically amplified resist composition
JAPAN SYNTHETIC RUBBER CO LTD25 citations92
US5494777AFeb 27, 1996
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD27 citations92
US5376498ADec 27, 1994
Negative type radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD22 citations92
US5413896AMay 9, 1995
I-ray sensitive positive resist composition
JAPAN SYNTHETIC RUBBER CO LTD16 citations73
US5672459ASep 30, 1997
Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
JAPAN SYNTHETIC RUBBER CO LTD3 citations62
US5798201AAug 25, 1998
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD3 citations60
US5707558AJan 13, 1998
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD2 citations60
JSR CORP
9 patentsUS5916729AJun 29, 1999
Chemically amplified resist composition
JSR CORP42 citations96
US6727032B1Apr 27, 2004
Radiation-sensitive resin composition
JSR CORP26 citations92
USRE37179EMay 15, 2001
Radiation sensitive resin composition
JSR CORP35 citations92
US6048666AApr 11, 2000
Radiation sensitive resin composition
JSR CORP23 citations91
US6040117AMar 21, 2000
Negative photoresist stripping liquid composition
JSR CORP26 citations91
US5942369AAug 24, 1999
Positive photoresist composition
JSR CORP50 citations91
US5965328AOct 12, 1999
Radiation sensitive resin composition and material for forming bumps containing the same
JSR CORP34 citations90
US6692887B1Feb 17, 2004
Radiation-sensitive resin composition
JSR CORP16 citations84
US6114086ASep 5, 2000
Chemically amplified resist composition
JSR CORP10 citations74