Inventor · disambiguated record
Mi-Sook Jeon
Also filed as: JEON MI-SOOK
9 granted patents·114 citations·filing 1998–2003
89Inventor score
Files withSAMSUNG ELECTRONICS CO LTD9
Top patents by PatentIndex Score
9 records- 0178US6432622B1Photoresist stripper composition and method for stripping photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 13, 2002·21 cites·12 claims
- 0276US6451223B1Thinner composition and methods and systems for using the thinner compositionSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 17, 2002·17 cites·6 claims
- 0372US6458518B1Photoresist stripper composition and method for stripping photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Oct 1, 2002·15 cites·12 claims
- 0468US6589719B1Photoresist stripper compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 8, 2003·10 cites·22 claims
- 0561US6682876B2Thinner composition and method of stripping a photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jan 27, 2004·7 cites·21 claims
- 0655US6159646ARework method utilizing thinner for wafers in manufacturing of semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Dec 12, 2000·23 cites·14 claims
- 0743US6261970B1Thinner composition and methods and systems for using the thinner compositionSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Jul 17, 2001·9 cites·14 claims
- 0839US6207358B1Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxideSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 27, 2001·8 cites·11 claims
- 0935US6337174B1Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxideSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Jan 8, 2002·4 cites·23 claims
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