Inventor
OZIAS ALBERT E
US20 patents
⚠️ This page may combine multiple inventors who share the name “OZIAS ALBERT E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EPSILON TECHN INC
13 patentsUS5198034AMar 30, 1993
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
EPSILON TECHN INC279 citations99
US4836138AJun 6, 1989
Heating system for reaction chamber of chemical vapor deposition equipment
EPSILON TECHN INC166 citations99
US4828224AMay 9, 1989
Chemical vapor deposition system
EPSILON TECHN INC557 citations98
US4975561ADec 4, 1990
Heating system for substrates
EPSILON TECHN INC98 citations96
US4846102AJul 11, 1989
Reaction chambers for CVD systems
EPSILON TECHN INC97 citations96
US5318634AJun 7, 1994
Substrate supporting apparatus
EPSILON TECHN INC26 citations92
US5261960ANov 16, 1993
Reaction chambers for CVD systems
EPSILON TECHN INC26 citations92
US5117769AJun 2, 1992
Drive shaft apparatus for a susceptor
EPSILON TECHN INC53 citations92
US5096534AMar 17, 1992
Method for improving the reactant gas flow in a reaction chamber
EPSILON TECHN INC24 citations92
US5092728AMar 3, 1992
Substrate loading apparatus for a CVD process
EPSILON TECHN INC51 citations92
US4996942AMar 5, 1991
Rotatable substrate supporting susceptor with temperature sensors
EPSILON TECHN INC36 citations92
US5044315ASep 3, 1991
Apparatus for improving the reactant gas flow in a reaction chamber
EPSILON TECHN INC15 citations74
US4993355AFeb 19, 1991
Susceptor with temperature sensing device
EPSILON TECHN INC13 citations74
ADVANCED SEMICONDUCTOR MAT
4 patentsUS5374315ADec 20, 1994
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
ADVANCED SEMICONDUCTOR MAT506 citations99
US5435682AJul 25, 1995
Chemical vapor desposition system
ADVANCED SEMICONDUCTOR MAT74 citations96
US5427620AJun 27, 1995
Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
ADVANCED SEMICONDUCTOR MAT59 citations96
US5244694ASep 14, 1993
Apparatus for improving the reactant gas flow in a reaction chamber
ADVANCED SEMICONDUCTOR MAT29 citations92