Inventor
ISHIKAWA HISAKO
JP7 patents
Patents
7 patentsUS10585348B2Mar 10, 2020
Pellicle, pellicle production method and exposure method using pellicle
MITSUI CHEMICALS INC2 citations71
US11852968B2Dec 26, 2023
Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
MITSUI CHEMICALS INC0 citations60
US11137677B2Oct 5, 2021
Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method
MITSUI CHEMICALS INC0 citations60
US12287569B2Apr 29, 2025
Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography
MITSUI CHEMICALS INC0 citations59
US10895805B2Jan 19, 2021
Pellicle manufacturing method and method for manufacturing photomask with pellicle
MITSUI CHEMICALS INC0 citations50
US10106660B2Oct 23, 2018
Film containing a resin having a thiourethane bond and uses thereof
MITSUI CHEMICALS INC0 citations49
US10488751B2Nov 26, 2019
Pellicle, production method thereof, exposure method
MITSUI CHEMICALS INC0 citations40