Inventor
MARTIN ANNETTE L
US17 patents
⚠️ This page may combine multiple inventors who share the name “MARTIN ANNETTE L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
11 patentsUS5416045AMay 16, 1995
Method for chemical vapor depositing a titanium nitride layer on a semiconductor wafer and method of annealing tin films
MICRON TECHNOLOGY INC76 citations93
US6451504B2Sep 17, 2002
Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride
MICRON TECHNOLOGY INC19 citations92
US5926742AJul 20, 1999
Controlling semiconductor structural warpage in rapid thermal processing by selective and dynamic control of a heating source
MICRON TECHNOLOGY INC24 citations92
US5926739AJul 20, 1999
Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride
MICRON TECHNOLOGY INC31 citations92
USRE36050EJan 19, 1999
Method for repeatable temperature measurement using surface reflectivity
MICRON TECHNOLOGY INC26 citations92
US5851929ADec 22, 1998
Controlling semiconductor structural warpage in rapid thermal processing by selective and dynamic control of a heating source
MICRON TECHNOLOGY INC18 citations92
US6693345B2Feb 17, 2004
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials
MICRON TECHNOLOGY INC6 citations74
US6417559B1Jul 9, 2002
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials
MICRON TECHNOLOGY INC10 citations74
US6323139B1Nov 27, 2001
Semiconductor processing methods of forming photoresist over silicon nitride materials
MICRON TECHNOLOGY INC5 citations74
US7057263B2Jun 6, 2006
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials
MICRON TECHNOLOGY INC2 citations63
US6297171B1Oct 2, 2001
Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride
MICRON TECHNOLOGY INC2 citations63
MICRON SEMICONDUCTOR INC
6 patentsUS5425392AJun 20, 1995
Method DRAM polycide rowline formation
MICRON SEMICONDUCTOR INC76 citations96
US5360769ANov 1, 1994
Method for fabricating hybrid oxides for thinner gate devices
MICRON SEMICONDUCTOR INC72 citations94
US5382551AJan 17, 1995
Method for reducing the effects of semiconductor substrate deformities
MICRON SEMICONDUCTOR INC33 citations92
US5350236ASep 27, 1994
Method for repeatable temperature measurement using surface reflectivity
MICRON SEMICONDUCTOR INC21 citations92
US5264396ANov 23, 1993
Method for enhancing nitridation and oxidation growth by introducing pulsed NF3
MICRON SEMICONDUCTOR INC46 citations92
US5364187ANov 15, 1994
System for repeatable temperature measurement using surface reflectivity
MICRON SEMICONDUCTOR INC16 citations74