Inventor
MAGOME NOBUTAKA
JP74 patents
⚠️ This page may combine multiple inventors who share the name “MAGOME NOBUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
46 patentsUS7483119B2Jan 27, 2009
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP76 citations99
US6078380AJun 20, 2000
Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
NIKON CORP165 citations99
US7460207B2Dec 2, 2008
Exposure apparatus and method for producing device
NIKON CORP87 citations98
US7436487B2Oct 14, 2008
Exposure apparatus and method for producing device
NIKON CORP75 citations98
US7379158B2May 27, 2008
Exposure apparatus and method for producing device
NIKON CORP85 citations98
US6876946B2Apr 5, 2005
Alignment method and apparatus therefor
NIKON CORP80 citations98
US6278957B1Aug 21, 2001
Alignment method and apparatus therefor
NIKON CORP116 citations98
US6118516ASep 12, 2000
Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns
NIKON CORP134 citations98
US5402224AMar 28, 1995
Distortion inspecting method for projection optical system
NIKON CORP150 citations98
US5489986AFeb 6, 1996
Position detecting apparatus
NIKON CORP119 citations97
US6538740B1Mar 25, 2003
Adjusting method for position detecting apparatus
NIKON CORP64 citations96
US6160619ADec 12, 2000
Projection exposure apparatus having compact substrate stage
NIKON CORP78 citations96
US5966201AOct 12, 1999
Mark for position detection, and mark detecting method and apparatus
NIKON CORP68 citations96
US5805866ASep 8, 1998
Alignment method
NIKON CORP76 citations96
US5734478AMar 31, 1998
Projection exposure apparatus
NIKON CORP55 citations96
US5587794ADec 24, 1996
Surface position detection apparatus
NIKON CORP45 citations96
US5576829ANov 19, 1996
Method and apparatus for inspecting a phase-shifted mask
NIKON CORP75 citations96
US5521036AMay 28, 1996
Positioning method and apparatus
NIKON CORP103 citations96
US5347356ASep 13, 1994
Substrate aligning device using interference light generated by two beams irradiating diffraction grating
NIKON CORP71 citations96
US5160849ANov 3, 1992
Diffraction-type displacement detector for alignment of mask and wafer
NIKON CORP81 citations96
US5151750ASep 29, 1992
Alignment apparatus
NIKON CORP88 citations96
US5118953AJun 2, 1992
Substrate alignment apparatus using diffracted and reflected radiation beams
NIKON CORP54 citations96
US5070250ADec 3, 1991
Position detection apparatus with adjustable beam and interference fringe positions
NIKON CORP61 citations96
US5004348AApr 2, 1991
Alignment device
NIKON CORP70 citations96
US7515246B2Apr 7, 2009
Exposure apparatus, exposure method, and method for producing device
NIKON CORP26 citations93
US7505115B2Mar 17, 2009
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP19 citations93
US7466392B2Dec 16, 2008
Exposure apparatus, exposure method, and method for producing device
NIKON CORP30 citations93
US6677088B2Jan 13, 2004
Photomask producing method and apparatus and device manufacturing method
NIKON CORP42 citations93
US6356343B1Mar 12, 2002
Mark for position detection and mark detecting method and apparatus
NIKON CORP30 citations93
US6132908AOct 17, 2000
Photo mask and exposure method using the same
NIKON CORP18 citations93
US6124933ASep 26, 2000
Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus
NIKON CORP20 citations93
US5801835ASep 1, 1998
Surface position detection apparatus and method
NIKON CORP25 citations93
US5483311AJan 9, 1996
Projection exposure apparatus
NIKON CORP29 citations93
US5343270AAug 30, 1994
Projection exposure apparatus
NIKON CORP40 citations93
US7911582B2Mar 22, 2011
Exposure apparatus and device manufacturing method
NIKON CORP15 citations92
US6141107AOct 31, 2000
Apparatus for detecting a position of an optical mark
NIKON CORP27 citations92
US5907405AMay 25, 1999
Alignment method and exposure system
NIKON CORP40 citations92
US5774240AJun 30, 1998
Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques
NIKON CORP29 citations92
US5689339ANov 18, 1997
Alignment apparatus
NIKON CORP48 citations92
US5528390AJun 18, 1996
Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques
NIKON CORP22 citations92
US5504596AApr 2, 1996
Exposure method and apparatus using holographic techniques
NIKON CORP29 citations92
US5171999ADec 15, 1992
Adjustable beam and interference fringe position
NIKON CORP40 citations92
US5289231AFeb 22, 1994
Apparatus for manufacturing disc medium
NIKON CORP44 citations89
US6320195B1Nov 20, 2001
Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the device
NIKON CORP15 citations84
US8749757B2Jun 10, 2014
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP4 citations83
US8040491B2Oct 18, 2011
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP4 citations74
NIPPON KOGAKU KK
4 patentsUS6710854B2Mar 23, 2004
Projection exposure apparatus
NIPPON KOGAKU KK32 citations96
US4710026ADec 1, 1987
Position detection apparatus
NIPPON KOGAKU KK134 citations96
US4739373AApr 19, 1988
Projection exposure apparatus
NIPPON KOGAKU KK30 citations93
US5754300AMay 19, 1998
Alignment method and apparatus
NIPPON KOGAKU KK26 citations92
Showing the top 50 of 74 patents by PatentIndex Score.