Inventor
SPINDLER OSWALD
DE12 patents
⚠️ This page may combine multiple inventors who share the name “SPINDLER OSWALD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SIEMENS AG
7 patentsUS5281302AJan 25, 1994
Method for cleaning reaction chambers by plasma etching
SIEMENS AG87 citations95
US5965203AOct 12, 1999
Method for depositing a silicon oxide layer
SIEMENS AG27 citations92
US5399389AMar 21, 1995
Method for locally and globally planarizing chemical vapor deposition of SiO2 layers onto structured silicon substrates
SIEMENS AG31 citations90
US5629053AMay 13, 1997
Method for manufacturing microcrystalline cubic boron-nitride-layers
SIEMENS AG17 citations71
US4990365AFeb 5, 1991
Method for producing silicon boronitride layers
SIEMENS AG11 citations71
US5837611ANov 17, 1998
Production method for an insulation layer functioning as an intermetal dielectric
SIEMENS AG4 citations62
US5780103AJul 14, 1998
Method for forming of a silicon oxide layer on a topography
SIEMENS AG4 citations60
INFINEON TECHNOLOGIES AG
3 patentsUS6429092B1Aug 6, 2002
Collar formation by selective oxide deposition
INFINEON TECHNOLOGIES AG7 citations73
US6815224B2Nov 9, 2004
Low-temperature processing of a ferroelectric strontium bismuth tantalate layer, and fabrication of ferroelectric components using the layer
INFINEON TECHNOLOGIES AG0 citations50
US6380074B1Apr 30, 2002
Deposition of various base layers for selective layer growth in semiconductor production
INFINEON TECHNOLOGIES AG0 citations48