Inventor
CHANG JUI-YU
TW18 patents
⚠️ This page may combine multiple inventors who share the name “CHANG JUI-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
14 patentsUS6043133AMar 28, 2000
Method of photo alignment for shallow trench isolation chemical-mechanical polishing
TAIWAN SEMICONDUCTOR MFG88 citations98
US6465294B1Oct 15, 2002
Self-aligned process for a stacked gate RF MOSFET device
TAIWAN SEMICONDUCTOR MFG31 citations92
US6080635AJun 27, 2000
Method of photo alignment for shallow trench isolation with chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG21 citations92
US6020249AFeb 1, 2000
Method for photo alignment after CMP planarization
TAIWAN SEMICONDUCTOR MFG20 citations92
US5933744AAug 3, 1999
Alignment method for used in chemical mechanical polishing process
TAIWAN SEMICONDUCTOR MFG53 citations92
US5923996AJul 13, 1999
Method to protect alignment mark in CMP process
TAIWAN SEMICONDUCTOR MFG31 citations92
US5972798AOct 26, 1999
Prevention of die loss to chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG16 citations82
US6737310B2May 18, 2004
Self-aligned process for a stacked gate RF MOSFET device
TAIWAN SEMICONDUCTOR MFG11 citations74
US6465897B1Oct 15, 2002
Method for photo alignment after CMP planarization
TAIWAN SEMICONDUCTOR MFG8 citations74
US5968687AOct 19, 1999
Mask for recovering alignment marks after chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG8 citations72
US5843600ADec 1, 1998
Use of sub divided pattern for alignment mark recovery after inter-level dielectric planarization
TAIWAN SEMICONDUCTOR MFG7 citations71
US5858588AJan 12, 1999
Method for recovering alignment marks after chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG4 citations61
US6444371B1Sep 3, 2002
Prevention of die loss to chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG1 citations52
US5902707AMay 11, 1999
Mask containing alignment mark protection pattern
TAIWAN SEMICONDUCTOR MFG1 citations50