P

Inventor

OXLAND RICHARD KENNETH

BE27 patents
⚠️ This page may combine multiple inventors who share the name “OXLAND RICHARD KENNETH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

21 patents
US9214555B2Dec 15, 2015

Barrier layer for FinFET channels

TAIWAN SEMICONDUCTOR MFG CO LTD591 citations99
US9472618B2Oct 18, 2016

Nanowire field effect transistor device having a replacement gate

TAIWAN SEMICONDUCTOR MFG CO LTD747 citations98
US10049946B2Aug 14, 2018

Vertical CMOS structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9472551B2Oct 18, 2016

Vertical CMOS structure and method

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9412871B2Aug 9, 2016

FinFET with channel backside passivation layer device and method

TAIWAN SEMICONDUCTOR MFG CO LTD11 citations84
US10510853B2Dec 17, 2019

FinFET with two fins on STI

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10121858B2Nov 6, 2018

Elongated semiconductor structure planarization

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US9502541B2Nov 22, 2016

Forming fins on the sidewalls of a sacrificial fin to form a FinFET

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US9911599B2Mar 6, 2018

Method of fabricating nanowire field effect transistor having a preplacement gate by using sacrificial etch layer

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10522621B2Dec 31, 2019

Nanowire field effect transistor device having a replacement gate

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10276660B2Apr 30, 2019

Nanowire field effect transistor having a metal gate surrounding semiconductor nanowire

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10164024B2Dec 25, 2018

Heterostructures for semiconductor devices and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10164031B2Dec 25, 2018

FinFET with two fins on STI

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9887272B2Feb 6, 2018

Method for forming counterdoped semiconductor device comprising first epitaxial layer and second epitaxial layer formed over first epitaxial layer having conductivity type different than second epitaxial layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9768263B2Sep 19, 2017

Semiconductor devices and FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9590084B2Mar 7, 2017

Graded heterojunction nanowire device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9406791B2Aug 2, 2016

Transistors, semiconductor devices, and methods of manufacture thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9391153B2Jul 12, 2016

III-V compound semiconductor device having metal contacts and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9054186B2Jun 9, 2015

III-V compound semiconductor device having metal contacts and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10861933B2Dec 8, 2020

Elongated semiconductor structure planarization

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9685514B2Jun 20, 2017

III-V compound semiconductor device having dopant layer and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42

TAIWAN SEMICONDUCTOR MFG

4 patents

OXLAND RICHARD KENNETH

2 patents