Inventor
OXLAND RICHARD KENNETH
BE27 patents
⚠️ This page may combine multiple inventors who share the name “OXLAND RICHARD KENNETH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
21 patentsUS9214555B2Dec 15, 2015
Barrier layer for FinFET channels
TAIWAN SEMICONDUCTOR MFG CO LTD591 citations99
US9472618B2Oct 18, 2016
Nanowire field effect transistor device having a replacement gate
TAIWAN SEMICONDUCTOR MFG CO LTD747 citations98
US10049946B2Aug 14, 2018
Vertical CMOS structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9472551B2Oct 18, 2016
Vertical CMOS structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9412871B2Aug 9, 2016
FinFET with channel backside passivation layer device and method
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations84
US10510853B2Dec 17, 2019
FinFET with two fins on STI
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10121858B2Nov 6, 2018
Elongated semiconductor structure planarization
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US9502541B2Nov 22, 2016
Forming fins on the sidewalls of a sacrificial fin to form a FinFET
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US9911599B2Mar 6, 2018
Method of fabricating nanowire field effect transistor having a preplacement gate by using sacrificial etch layer
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10522621B2Dec 31, 2019
Nanowire field effect transistor device having a replacement gate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10276660B2Apr 30, 2019
Nanowire field effect transistor having a metal gate surrounding semiconductor nanowire
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10164024B2Dec 25, 2018
Heterostructures for semiconductor devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10164031B2Dec 25, 2018
FinFET with two fins on STI
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9887272B2Feb 6, 2018
Method for forming counterdoped semiconductor device comprising first epitaxial layer and second epitaxial layer formed over first epitaxial layer having conductivity type different than second epitaxial layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9768263B2Sep 19, 2017
Semiconductor devices and FinFET devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9590084B2Mar 7, 2017
Graded heterojunction nanowire device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9406791B2Aug 2, 2016
Transistors, semiconductor devices, and methods of manufacture thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9391153B2Jul 12, 2016
III-V compound semiconductor device having metal contacts and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9054186B2Jun 9, 2015
III-V compound semiconductor device having metal contacts and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10861933B2Dec 8, 2020
Elongated semiconductor structure planarization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9685514B2Jun 20, 2017
III-V compound semiconductor device having dopant layer and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42
TAIWAN SEMICONDUCTOR MFG
4 patentsUS9136332B2Sep 15, 2015
Method for forming a nanowire field effect transistor device having a replacement gate
TAIWAN SEMICONDUCTOR MFG5 citations84
US9355920B2May 31, 2016
Methods of forming semiconductor devices and FinFET devices, and FinFET devices
TAIWAN SEMICONDUCTOR MFG3 citations73
US9385198B2Jul 5, 2016
Heterostructures for semiconductor devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG1 citations52
US9231102B2Jan 5, 2016
Asymmetric semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations52