Inventor
WANG LARRY YU
US7 patents
Patents
7 patentsUS6087243AJul 11, 2000
Method of forming trench isolation with high integrity, ultra thin gate oxide
ADVANCED MICRO DEVICES INC71 citations94
US5893744AApr 13, 1999
Method of forming a zero layer mark for alignment in integrated circuit manufacturing process employing shallow trench isolation
ADVANCED MICRO DEVICES INC84 citations94
US5926723AJul 20, 1999
Generation of a loose planarization mask having relaxed boundary conditions for use in shallow trench isolation processes
ADVANCED MICRO DEVICES INC48 citations91
US5963816AOct 5, 1999
Method for making shallow trench marks
ADVANCED MICRO DEVICES INC47 citations89
US6232635B1May 15, 2001
Method to fabricate a high coupling flash cell with less silicide seam problem
ADVANCED MICRO DEVICES INC12 citations73
US6530997B1Mar 11, 2003
Use of gaseous silicon hydrides as a reducing agent to remove re-sputtered silicon oxide
ADVANCED MICRO DEVICES INC2 citations62
US6265273B1Jul 24, 2001
Method of forming rectangular shaped spacers
ADVANCED MICRO DEVICES INC2 citations62