P

Inventor

PARK STEPHEN KEETAI

US17 patents

Patents

17 patents
US6303486B1Oct 16, 2001

Method of fabricating copper-based semiconductor devices using a sacrificial dielectric layer and an unconstrained copper anneal

ADVANCED MICRO DEVICES INC63 citations96
US6100559AAug 8, 2000

Multipurpose graded silicon oxynitride cap layer

ADVANCED MICRO DEVICES INC60 citations96
US6576949B1Jun 10, 2003

Integrated circuit having optimized gate coupling capacitance

ADVANCED MICRO DEVICES INC25 citations92
US6486506B1Nov 26, 2002

Flash memory with less susceptibility to charge gain and charge loss

ADVANCED MICRO DEVICES INC25 citations92
US6355555B1Mar 12, 2002

Method of fabricating copper-based semiconductor devices using a sacrificial dielectric layer

ADVANCED MICRO DEVICES INC42 citations92
US6306758B1Oct 23, 2001

Multipurpose graded silicon oxynitride cap layer

ADVANCED MICRO DEVICES INC22 citations92
US6287917B1Sep 11, 2001

Process for fabricating an MNOS flash memory device

ADVANCED MICRO DEVICES INC50 citations92
US6881665B1Apr 19, 2005

Depth of focus (DOF) for trench-first-via-last (TFVL) damascene processing with hard mask and low viscosity photoresist

ADVANCED MICRO DEVICES INC13 citations83
US6265306B1Jul 24, 2001

Resist flow method for defining openings for conductive interconnections in a dielectric layer

ADVANCED MICRO DEVICES INC16 citations80
US6682978B1Jan 27, 2004

Integrated circuit having increased gate coupling capacitance

ADVANCED MICRO DEVICES INC11 citations74
US6756297B2Jun 29, 2004

Method of fabricating copper-based semiconductor devices using a sacrificial dielectric layer

ADVANCED MICRO DEVICES INC11 citations73
US6232635B1May 15, 2001

Method to fabricate a high coupling flash cell with less silicide seam problem

ADVANCED MICRO DEVICES INC12 citations73
US6107169AAug 22, 2000

Method for fabricating a doped polysilicon feature in a semiconductor device

ADVANCED MICRO DEVICES INC11 citations73
US6410443B1Jun 25, 2002

Method for removing semiconductor ARC using ARC CMP buffing

ADVANCED MICRO DEVICES INC12 citations72
US6265294B1Jul 24, 2001

Integrated circuit having double bottom anti-reflective coating layer

ADVANCED MICRO DEVICES INC8 citations72
US6420104B1Jul 16, 2002

Method of reducing contact size by spacer filling

ADVANCED MICRO DEVICES INC5 citations63
US6265273B1Jul 24, 2001

Method of forming rectangular shaped spacers

ADVANCED MICRO DEVICES INC2 citations62