Inventor
DASSAPA FRANCOIS C
US2 patents
Patents
2 patentsUS10773282B2Sep 15, 2020
Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
TOKYO ELECTRON LTD45 citations89
US11273469B2Mar 15, 2022
Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
TOKYO ELECTRON LTD0 citations57