P

Inventor

SHIRAISHI HIROSHI

JP43 patents
⚠️ This page may combine multiple inventors who share the name “SHIRAISHI HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

19 patents
US5512328AApr 30, 1996

Method for forming a pattern and forming a thin film used in pattern formation

HITACHI LTD336 citations98
US6653052B2Nov 25, 2003

Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

HITACHI LTD15 citations92
US6319649B1Nov 20, 2001

Photosensitive resin composition and method of forming resist images

HITACHI LTD31 citations92
US5350485ASep 27, 1994

High-resolution lithography and semiconductor device manufacturing method

HITACHI LTD30 citations92
US5330880AJul 19, 1994

Process for producing optical disks

HITACHI LTD35 citations92
US5324550AJun 28, 1994

Pattern forming method

HITACHI LTD21 citations92
US4722881AFeb 2, 1988

Radiation-sensitive resist composition with an admixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane

HITACHI LTD49 citations92
US4409317AOct 11, 1983

Radiation sensitive coating composition

HITACHI LTD29 citations92
US5441849AAug 15, 1995

Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer

HITACHI LTD30 citations91
US6703171B2Mar 9, 2004

Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method

HITACHI LTD13 citations84
US6017680AJan 25, 2000

Method for pattern formation and process for preparing semiconductor device

HITACHI LTD13 citations82
US4835089AMay 30, 1989

Resist pattern forming process with dry etching

HITACHI LTD22 citations81
US5118582AJun 2, 1992

Pattern forming material and process for forming pattern using the same

HITACHI LTD19 citations78
US6156486ADec 5, 2000

Method for pattern formation and process for preparing semiconductor device

HITACHI LTD7 citations74
US7642145B2Jan 5, 2010

Method for producing electronic device

HITACHI LTD7 citations73
US4465768AAug 14, 1984

Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate

HITACHI LTD15 citations73
US6489082B1Dec 3, 2002

Method for pattern formation and process for preparing semiconductor device

HITACHI LTD3 citations63
US6855483B2Feb 15, 2005

Method for pattern formation and process for preparing semiconductor device

HITACHI LTD0 citations52
US5470996ANov 28, 1995

Pattern forming material and process for forming pattern using the same

HITACHI LTD1 citations48

UBE INDUSTRIES

7 patents

RENESAS TECH CORP

3 patents

OLYMPUS CORP

3 patents

HITACHI CHEMICAL CO LTD

2 patents

IZUHARA KENJI

2 patents

UNIV SAGA

2 patents

HITICHI LTD

1 patent

SUNTORY LTD

1 patent

NIPPON STEEL CORP

1 patent

KAJIMA CORP

1 patent

FUJITSU MICROELECTRONICS LTD

1 patent