Inventor
YAMADA YASUHISA
JP29 patents
⚠️ This page may combine multiple inventors who share the name “YAMADA YASUHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NSK LTD
9 patentsUS7322607B2Jan 29, 2008
Telescopic shaft for steering vehicle and telescopic shaft for steering vehicle with cardan shaft coupling
NSK LTD36 citations92
US7559267B2Jul 14, 2009
Extendable shaft for vehicle steering
NSK LTD12 citations84
US7416199B2Aug 26, 2008
Steering device for motor vehicle
NSK LTD14 citations84
US7404768B2Jul 29, 2008
Telescopic shaft for motor vehicle steering
NSK LTD9 citations84
US7338078B2Mar 4, 2008
Extensible shaft for steering of vehicle
NSK LTD9 citations84
US7481130B2Jan 27, 2009
Vehicle steering telescopic shaft
NSK LTD20 citations83
US7416216B2Aug 26, 2008
Telescopic shaft for vehicle steering
NSK LTD16 citations82
US7338382B2Mar 4, 2008
Extendable vehicle steering shaft
NSK LTD8 citations74
US7429060B2Sep 30, 2008
Telescopic shaft for steering of vehicle, and telescopic shaft for steering of vehicle with cardan shaft joint
NSK LTD8 citations72
NEC CORP
9 patentsUS5968686AOct 19, 1999
Charged-beam exposure mask and charged-beam exposure method
NEC CORP22 citations92
US5731591AMar 24, 1998
Beam exposure system having improved mask unit
NEC CORP23 citations86
US6393604B1May 21, 2002
Process for preparing data for direct-writing by a charged particle ray, process for verifying data for direct-writing by a charged particle ray, process for displaying data for direct-writing by a charged particle ray, and exposure device
NEC CORP17 citations77
US6647543B2Nov 11, 2003
Method for manufacturing a pair of complementary masks
NEC CORP3 citations63
US6251541B1Jun 26, 2001
Partial collective mask for a charged particle beam
NEC CORP2 citations63
US6192510B1Feb 20, 2001
Method of preparing a partial one-shot electron beam exposure mask and method of direct-writing patterns by use of a partial one-shot electron beam exposure mask
NEC CORP5 citations63
US6114093ASep 5, 2000
Method of drawing a pattern by direct writing with charged particle beam utilizing resist containing metal powder
NEC CORP2 citations63
US6492074B2Dec 10, 2002
Mask for electron beam drawing utilizing auxiliary patterns that do not bore through the substrate
NEC CORP0 citations52
US6277530B1Aug 21, 2001
Method for making partial full-wafer pattern for charged particle beam lithography
NEC CORP1 citations52
YAMADA YASUHISA
3 patentsUS8400516B2Mar 19, 2013
Image stabilization control circuit and imaging device having image stabilization control circuit
YAMADA YASUHISA8 citations79
US8336669B2Dec 25, 2012
Steering apparatus
YAMADA YASUHISA4 citations61
US8570385B2Oct 29, 2013
Image stabilization control circuit and imaging device having image stabilization control circuit
YAMADA YASUHISA3 citations58
NSK STEERING SYS EUROP LTD
2 patentsSANYO ELECTRIC CO
2 patentsNEC ELECTRONICS CORP
2 patentsUS6610988B1Aug 26, 2003
Charged particle beam drawing apparatus and charged particle beam drawing method
NEC ELECTRONICS CORP3 citations63
US6692877B2Feb 17, 2004
Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same
NEC ELECTRONICS CORP1 citations52