Inventor
DELEHANTY DONALD J
US5 patents
Patents
5 patentsUS6425956B1Jul 30, 2002
Process for removing chemical mechanical polishing residual slurry
IBM44 citations92
US6837777B2Jan 4, 2005
Wafer edge cleaning utilizing polish pad material
IBM39 citations91
US6622334B1Sep 23, 2003
Wafer edge cleaning utilizing polish pad material
IBM35 citations91
US7040966B2May 9, 2006
Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers
IBM1 citations44
US7214623B2May 8, 2007
Planarization system and method using a carbonate containing fluid
IBM0 citations35