P

Inventor

NATARAJAN SANJAY

US28 patents
⚠️ This page may combine multiple inventors who share the name “NATARAJAN SANJAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

21 patents
US11295786B2Apr 5, 2022

3D dram structure with high mobility channel

APPLIED MATERIALS INC5 citations73
US11152479B2Oct 19, 2021

Semiconductor device, method of making a semiconductor device, and processing system

APPLIED MATERIALS INC3 citations73
US11114320B2Sep 7, 2021

Processing system and method of forming a contact

APPLIED MATERIALS INC3 citations72
US10903112B2Jan 26, 2021

Methods and apparatus for smoothing dynamic random access memory bit line metal

APPLIED MATERIALS INC2 citations72
US10529602B1Jan 7, 2020

Method and apparatus for substrate fabrication

APPLIED MATERIALS INC5 citations72
US11621266B2Apr 4, 2023

Method of testing a gap fill for DRAM

APPLIED MATERIALS INC2 citations71
US11195923B2Dec 7, 2021

Method of fabricating a semiconductor device having reduced contact resistance

APPLIED MATERIALS INC5 citations71
US11171141B2Nov 9, 2021

Gap fill methods of forming buried word lines in DRAM without forming bottom voids

APPLIED MATERIALS INC2 citations71
US11749315B2Sep 5, 2023

3D DRAM structure with high mobility channel

APPLIED MATERIALS INC0 citations62
US11705335B2Jul 18, 2023

Conformal high concentration boron doping of semiconductors

APPLIED MATERIALS INC0 citations62
US11682668B2Jun 20, 2023

Stacked transistor device

APPLIED MATERIALS INC1 citations62
US11462411B2Oct 4, 2022

Gate contact over active regions

APPLIED MATERIALS INC0 citations62
US11328928B2May 10, 2022

Conformal high concentration boron doping of semiconductors

APPLIED MATERIALS INC0 citations62
US11309404B2Apr 19, 2022

Integrated CMOS source drain formation with advanced control

APPLIED MATERIALS INC1 citations62
US11189635B2Nov 30, 2021

3D-NAND mold

APPLIED MATERIALS INC0 citations62
US11177254B2Nov 16, 2021

Stacked transistor device

APPLIED MATERIALS INC0 citations62
US11004687B2May 11, 2021

Gate contact over active processes

APPLIED MATERIALS INC1 citations62
US12062708B2Aug 13, 2024

Selective silicon etch for gate all around transistors

APPLIED MATERIALS INC0 citations60
US11508828B2Nov 22, 2022

Selective silicon etch for gate all around transistors

APPLIED MATERIALS INC0 citations60
US12374584B2Jul 29, 2025

Multi color stack for self aligned dual pattern formation for multi purpose device structures

APPLIED MATERIALS INC0 citations50
US10700072B2Jun 30, 2020

Cap layer for bit line resistance reduction

APPLIED MATERIALS INC0 citations41

INTEL CORP

3 patents

MICROMATERIALS LLC

3 patents

Mircomaterials LLC

1 patent