Inventor
NATARAJAN SANJAY
US28 patents
⚠️ This page may combine multiple inventors who share the name “NATARAJAN SANJAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
21 patentsUS11295786B2Apr 5, 2022
3D dram structure with high mobility channel
APPLIED MATERIALS INC5 citations73
US11152479B2Oct 19, 2021
Semiconductor device, method of making a semiconductor device, and processing system
APPLIED MATERIALS INC3 citations73
US11114320B2Sep 7, 2021
Processing system and method of forming a contact
APPLIED MATERIALS INC3 citations72
US10903112B2Jan 26, 2021
Methods and apparatus for smoothing dynamic random access memory bit line metal
APPLIED MATERIALS INC2 citations72
US10529602B1Jan 7, 2020
Method and apparatus for substrate fabrication
APPLIED MATERIALS INC5 citations72
US11621266B2Apr 4, 2023
Method of testing a gap fill for DRAM
APPLIED MATERIALS INC2 citations71
US11195923B2Dec 7, 2021
Method of fabricating a semiconductor device having reduced contact resistance
APPLIED MATERIALS INC5 citations71
US11171141B2Nov 9, 2021
Gap fill methods of forming buried word lines in DRAM without forming bottom voids
APPLIED MATERIALS INC2 citations71
US11749315B2Sep 5, 2023
3D DRAM structure with high mobility channel
APPLIED MATERIALS INC0 citations62
US11705335B2Jul 18, 2023
Conformal high concentration boron doping of semiconductors
APPLIED MATERIALS INC0 citations62
US11682668B2Jun 20, 2023
Stacked transistor device
APPLIED MATERIALS INC1 citations62
US11462411B2Oct 4, 2022
Gate contact over active regions
APPLIED MATERIALS INC0 citations62
US11328928B2May 10, 2022
Conformal high concentration boron doping of semiconductors
APPLIED MATERIALS INC0 citations62
US11309404B2Apr 19, 2022
Integrated CMOS source drain formation with advanced control
APPLIED MATERIALS INC1 citations62
US11189635B2Nov 30, 2021
3D-NAND mold
APPLIED MATERIALS INC0 citations62
US11177254B2Nov 16, 2021
Stacked transistor device
APPLIED MATERIALS INC0 citations62
US11004687B2May 11, 2021
Gate contact over active processes
APPLIED MATERIALS INC1 citations62
US12062708B2Aug 13, 2024
Selective silicon etch for gate all around transistors
APPLIED MATERIALS INC0 citations60
US11508828B2Nov 22, 2022
Selective silicon etch for gate all around transistors
APPLIED MATERIALS INC0 citations60
US12374584B2Jul 29, 2025
Multi color stack for self aligned dual pattern formation for multi purpose device structures
APPLIED MATERIALS INC0 citations50
US10700072B2Jun 30, 2020
Cap layer for bit line resistance reduction
APPLIED MATERIALS INC0 citations41