Inventor
GARZA MARIO
US31 patents
⚠️ This page may combine multiple inventors who share the name “GARZA MARIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LSI LOGIC CORP
29 patentsUS6081659AJun 27, 2000
Comparing aerial image to actual photoresist pattern for masking process characterization
LSI LOGIC CORP180 citations99
US6078738AJun 20, 2000
Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization
LSI LOGIC CORP182 citations99
US5723233AMar 3, 1998
Optical proximity correction method and apparatus
LSI LOGIC CORP323 citations99
US6282696B1Aug 28, 2001
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP278 citations98
US6269472B1Jul 31, 2001
Optical proximity correction method and apparatus
LSI LOGIC CORP356 citations98
US5804340ASep 8, 1998
Photomask inspection method and inspection tape therefor
LSI LOGIC CORP99 citations98
US5705301AJan 6, 1998
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP491 citations98
US6499003B2Dec 24, 2002
Method and apparatus for application of proximity correction with unitary segmentation
LSI LOGIC CORP88 citations97
US5972541AOct 26, 1999
Reticle and method of design to correct pattern for depth of focus problems
LSI LOGIC CORP96 citations97
US5900338AMay 4, 1999
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP86 citations96
US5330883AJul 19, 1994
Techniques for uniformizing photoresist thickness and critical dimension of underlying features
LSI LOGIC CORP31 citations96
US6611953B1Aug 26, 2003
Mask correction optimization
LSI LOGIC CORP23 citations92
US6532585B1Mar 11, 2003
Method and apparatus for application of proximity correction with relative segmentation
LSI LOGIC CORP15 citations92
US6175953B1Jan 16, 2001
Method and apparatus for general systematic application of proximity correction
LSI LOGIC CORP29 citations92
US5795682AAug 18, 1998
Guard rings to compensate for side lobe ringing in attenuated phase shift reticles
LSI LOGIC CORP54 citations92
US5595861AJan 21, 1997
Method of selecting and applying a top antireflective coating of a partially fluorinated compound
LSI LOGIC CORP18 citations92
US5549934AAug 27, 1996
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
LSI LOGIC CORP24 citations92
US5456952AOct 10, 1995
Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
LSI LOGIC CORP26 citations92
US6768958B2Jul 27, 2004
Automatic calibration of a masking process simulator
LSI LOGIC CORP35 citations91
US6782525B2Aug 24, 2004
Wafer process critical dimension, alignment, and registration analysis simulation tool
LSI LOGIC CORP23 citations90
US7149340B2Dec 12, 2006
Mask defect analysis for both horizontal and vertical processing effects
LSI LOGIC CORP12 citations82
US5554486ASep 10, 1996
Techniques for uniformizing photoresist thickness and critical dimension of underlying features through aerosol application of photoresist
LSI LOGIC CORP13 citations82
US6174630B1Jan 16, 2001
Method of proximity correction with relative segmentation
LSI LOGIC CORP12 citations73
US6868355B2Mar 15, 2005
Automatic calibration of a masking process simulator
LSI LOGIC CORP7 citations72
US5543265AAug 6, 1996
Photoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solvent
LSI LOGIC CORP2 citations63
US6701511B1Mar 2, 2004
Optical and etch proximity correction
LSI LOGIC CORP4 citations62
US6426131B1Jul 30, 2002
Off-axis pupil aperture and method for making the same
LSI LOGIC CORP5 citations61
US7069535B2Jun 27, 2006
Optical proximity correction method using weighted priorities
LSI LOGIC CORP4 citations57
US5587267ADec 24, 1996
Method of forming photoresist film exhibiting uniform reflectivity through electrostatic deposition
LSI LOGIC CORP0 citations52