Inventor
EIB NICHOLAS K
US22 patents
⚠️ This page may combine multiple inventors who share the name “EIB NICHOLAS K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LSI LOGIC CORP
13 patentsUS5723233AMar 3, 1998
Optical proximity correction method and apparatus
LSI LOGIC CORP323 citations99
US6282696B1Aug 28, 2001
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP278 citations98
US6269472B1Jul 31, 2001
Optical proximity correction method and apparatus
LSI LOGIC CORP356 citations98
US5705301AJan 6, 1998
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP491 citations98
US6499003B2Dec 24, 2002
Method and apparatus for application of proximity correction with unitary segmentation
LSI LOGIC CORP88 citations97
US6425117B1Jul 23, 2002
System and method for performing optical proximity correction on the interface between optical proximity corrected cells
LSI LOGIC CORP393 citations97
US5900338AMay 4, 1999
Performing optical proximity correction with the aid of design rule checkers
LSI LOGIC CORP86 citations96
US6109775AAug 29, 2000
Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon
LSI LOGIC CORP60 citations93
US6532585B1Mar 11, 2003
Method and apparatus for application of proximity correction with relative segmentation
LSI LOGIC CORP15 citations92
US6175953B1Jan 16, 2001
Method and apparatus for general systematic application of proximity correction
LSI LOGIC CORP29 citations92
US7189498B2Mar 13, 2007
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
LSI LOGIC CORP11 citations82
US6809824B1Oct 26, 2004
Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate
LSI LOGIC CORP12 citations73
US6174630B1Jan 16, 2001
Method of proximity correction with relative segmentation
LSI LOGIC CORP12 citations73
LSI CORP
5 patentsUS7372547B2May 13, 2008
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography
LSI CORP8 citations71
US7270942B2Sep 18, 2007
Optimized mirror design for optical direct write
LSI CORP4 citations61
US7264906B2Sep 4, 2007
OPC based illumination optimization with mask error constraints
LSI CORP4 citations61
US8377633B2Feb 19, 2013
Maskless vortex phase shift optical direct write lithography
LSI CORP0 citations50
US7738078B2Jun 15, 2010
Optimized mirror design for optical direct write
LSI CORP0 citations50