Inventor
BANBA TOSHIO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “BANBA TOSHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO BAKELITE CO
16 patentsUS5449584ASep 12, 1995
Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound
SUMITOMO BAKELITE CO80 citations94
US6235436B1May 22, 2001
Semiconductor device using positive photosensitive resin composition and process for preparation thereof
SUMITOMO BAKELITE CO24 citations92
US6207356B1Mar 27, 2001
Method for the pattern-processing of photosensitive resin composition
SUMITOMO BAKELITE CO39 citations92
US6071666AJun 6, 2000
Positive type photosensitive resin composition and semiconductor device using the same
SUMITOMO BAKELITE CO44 citations92
US5756260AMay 26, 1998
Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same
SUMITOMO BAKELITE CO22 citations91
US6576381B1Jun 10, 2003
Semiconductor device
SUMITOMO BAKELITE CO36 citations89
US7361445B2Apr 22, 2008
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
SUMITOMO BAKELITE CO10 citations83
US6607865B2Aug 19, 2003
Positive photosensitive resin composition
SUMITOMO BAKELITE CO13 citations83
US7238455B2Jul 3, 2007
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
SUMITOMO BAKELITE CO8 citations72
US6613699B2Sep 2, 2003
Process for producing a semiconductor device
SUMITOMO BAKELITE CO9 citations72
US5648451AJul 15, 1997
Process for producing photosensitive resin
SUMITOMO BAKELITE CO11 citations72
US7368205B2May 6, 2008
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
SUMITOMO BAKELITE CO5 citations63
US6284440B1Sep 4, 2001
Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same
SUMITOMO BAKELITE CO3 citations63
US6927013B2Aug 9, 2005
Positive photosensitive resin compositions and semiconductor device
SUMITOMO BAKELITE CO4 citations62
US7678514B2Mar 16, 2010
Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films
SUMITOMO BAKELITE CO1 citations45
US9005876B2Apr 14, 2015
Positive photosensitive resin composition for spray coating and method for producing through electrode using the same
SUMITOMO BAKELITE CO0 citations31
BANBA TOSHIO
3 patentsUS8080350B2Dec 20, 2011
Positive photosensitive resin composition, and semiconductor device and display therewith
BANBA TOSHIO22 citations86
US8198006B2Jun 12, 2012
Process for producing semiconductor device
BANBA TOSHIO0 citations50
US8309280B2Nov 13, 2012
Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device
BANBA TOSHIO0 citations39