P

Inventor

KUDO HIDEO

JP47 patents
⚠️ This page may combine multiple inventors who share the name “KUDO HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU HANDOTAI KK

30 patents
US5942445AAug 24, 1999

Method of manufacturing semiconductor wafers

SHINETSU HANDOTAI KK163 citations98
US5951374ASep 14, 1999

Method of polishing semiconductor wafers

SHINETSU HANDOTAI KK57 citations96
US5800725ASep 1, 1998

Method of manufacturing semiconductor wafers

SHINETSU HANDOTAI KK80 citations96
US5317778AJun 7, 1994

Automatic cleaning apparatus for wafers

SHINETSU HANDOTAI KK79 citations94
US5914053AJun 22, 1999

Apparatus and method for double-sided polishing semiconductor wafers

SHINETSU HANDOTAI KK39 citations93
US5827779AOct 27, 1998

Method of manufacturing semiconductor mirror wafers

SHINETSU HANDOTAI KK28 citations93
US5679212AOct 21, 1997

Method for production of silicon wafer and apparatus therefor

SHINETSU HANDOTAI KK54 citations93
US5474644ADec 12, 1995

Method and apparatus for high-flatness etching of wafer

SHINETSU HANDOTAI KK27 citations93
US5117590AJun 2, 1992

Method of automatically chamfering a wafer and apparatus therefor

SHINETSU HANDOTAI KK53 citations93
US5081733AJan 21, 1992

Automatic cleaning apparatus for disks

SHINETSU HANDOTAI KK38 citations93
US6346485B1Feb 12, 2002

Semiconductor wafer processing method and semiconductor wafers produced by the same

SHINETSU HANDOTAI KK16 citations92
US6239039B1May 29, 2001

Semiconductor wafers processing method and semiconductor wafers produced by the same

SHINETSU HANDOTAI KK17 citations92
US6050880AApr 18, 2000

Surface grinding device and method of surface grinding a thin-plate workpiece

SHINETSU HANDOTAI KK31 citations92
US5821167AOct 13, 1998

Method of manufacturing semiconductor mirror wafers

SHINETSU HANDOTAI KK24 citations92
US5503173AApr 2, 1996

Wafer cleaning tank

SHINETSU HANDOTAI KK42 citations92
US5282289AFeb 1, 1994

Scrubber apparatus for cleaning a thin disk work

SHINETSU HANDOTAI KK30 citations92
US5547515AAug 20, 1996

Method for handling or processing semiconductor wafers

SHINETSU HANDOTAI KK40 citations91
US5447890ASep 5, 1995

Method for production of wafer

SHINETSU HANDOTAI KK20 citations91
US6402594B1Jun 11, 2002

Polishing method for wafer and holding plate

SHINETSU HANDOTAI KK31 citations90
US6110839AAug 29, 2000

Method of purifying alkaline solution and method of etching semiconductor wafers

SHINETSU HANDOTAI KK30 citations90
US6077149AJun 20, 2000

Method and apparatus for surface-grinding of workpiece

SHINETSU HANDOTAI KK24 citations89
US5827395AOct 27, 1998

Polishing pad used for polishing silicon wafers and polishing method using the same

SHINETSU HANDOTAI KK12 citations74
US5759087AJun 2, 1998

Method for inducing damage for gettering to single crystal silicon wafer

SHINETSU HANDOTAI KK12 citations74
US5595412AJan 21, 1997

Device for handling wafers

SHINETSU HANDOTAI KK13 citations74
US5555634ASep 17, 1996

Wafer holder

SHINETSU HANDOTAI KK13 citations74
US6432837B2Aug 13, 2002

Semiconductor wafer processing method and semiconductor wafers produced by the same

SHINETSU HANDOTAI KK11 citations73
US5891353AApr 6, 1999

Polishing agent used for polishing semiconductor wafers and polishing method using the same

SHINETSU HANDOTAI KK6 citations73
US5866226AFeb 2, 1999

Polishing agent used for polishing semiconductor wafers and polishing method using the same

SHINETSU HANDOTAI KK8 citations73
US5790252AAug 4, 1998

Method of and apparatus for determining residual damage to wafer edges

SHINETSU HANDOTAI KK10 citations70
US5705423AJan 6, 1998

Epitaxial wafer

SHINETSU HANDOTAI KK9 citations69

PIONEER ELECTRONIC CORP

7 patents

SHINETSU POLYMER CO

2 patents

PIONEER CORP

2 patents

KUDO HIDEO

1 patent

FUJITSU LTD

1 patent

OISHI HIROSHI

1 patent

OHMI TADAHIRO

1 patent

SATO KAZUYA

1 patent

KITAGAWA KOJI

1 patent