P

Inventor

NISHII KATSUNORI

JP25 patents
⚠️ This page may combine multiple inventors who share the name “NISHII KATSUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

22 patents
US6639255B2Oct 28, 2003

GaN-based HFET having a surface-leakage reducing cap layer

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD98 citations98
US5872393AFeb 16, 1999

RF semiconductor device and a method for manufacturing the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD71 citations95
US6737683B2May 18, 2004

Semiconductor device composed of a group III-V nitride semiconductor

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD15 citations93
US6774449B1Aug 10, 2004

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations92
US6531718B2Mar 11, 2003

Semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21 citations92
US5370973ADec 6, 1994

Method of fabricating a fine structure electrode

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD25 citations92
US6153499ANov 28, 2000

Method of manufacturing semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD20 citations84
US6933181B2Aug 23, 2005

Method for fabricating semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6924516B2Aug 2, 2005

Semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6809352B2Oct 26, 2004

Palladium silicide (PdSi) schottky electrode for gallium nitride semiconductor devices

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations74
US6770922B2Aug 3, 2004

Semiconductor device composed of a group III-V nitride semiconductor

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations74
US6593193B2Jul 15, 2003

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations74
US5585655ADec 17, 1996

Field-effect transistor and method of manufacturing the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations73
US7122451B2Oct 17, 2006

Method for fabricating a semiconductor device including exposing a group III-V semiconductor to an ammonia plasma

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US7105907B2Sep 12, 2006

Gallium nitride compound semiconductor device having schottky contact

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6852612B2Feb 8, 2005

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6812505B2Nov 2, 2004

Semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US7449399B2Nov 11, 2008

Method for fabricating a semiconductor device for reducing a surface potential

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US7307292B2Dec 11, 2007

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US7037817B2May 2, 2006

Semiconductor device and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US6323538B1Nov 27, 2001

Bipolar transistor and method for fabricating the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US5942772AAug 24, 1999

Semiconductor device and method of manufacturing the same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52

MATSUSHITA ELECTRONICS CORP

2 patents

PANASONIC CORP

1 patent