Inventor
NISHII KATSUNORI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “NISHII KATSUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
22 patentsUS6639255B2Oct 28, 2003
GaN-based HFET having a surface-leakage reducing cap layer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD98 citations98
US5872393AFeb 16, 1999
RF semiconductor device and a method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD71 citations95
US6737683B2May 18, 2004
Semiconductor device composed of a group III-V nitride semiconductor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD15 citations93
US6774449B1Aug 10, 2004
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations92
US6531718B2Mar 11, 2003
Semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21 citations92
US5370973ADec 6, 1994
Method of fabricating a fine structure electrode
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD25 citations92
US6153499ANov 28, 2000
Method of manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD20 citations84
US6933181B2Aug 23, 2005
Method for fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6924516B2Aug 2, 2005
Semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6809352B2Oct 26, 2004
Palladium silicide (PdSi) schottky electrode for gallium nitride semiconductor devices
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations74
US6770922B2Aug 3, 2004
Semiconductor device composed of a group III-V nitride semiconductor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations74
US6593193B2Jul 15, 2003
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations74
US5585655ADec 17, 1996
Field-effect transistor and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations73
US7122451B2Oct 17, 2006
Method for fabricating a semiconductor device including exposing a group III-V semiconductor to an ammonia plasma
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US7105907B2Sep 12, 2006
Gallium nitride compound semiconductor device having schottky contact
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6852612B2Feb 8, 2005
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6812505B2Nov 2, 2004
Semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US7449399B2Nov 11, 2008
Method for fabricating a semiconductor device for reducing a surface potential
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US7307292B2Dec 11, 2007
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US7037817B2May 2, 2006
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US6323538B1Nov 27, 2001
Bipolar transistor and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US5942772AAug 24, 1999
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52