Inventor
ERVA HEMALATHA
US4 patents
Patents
4 patentsUS7783669B2Aug 24, 2010
Data flow management in generating profile models used in optical metrology
TOKYO ELECTRON LTD11 citations82
US7765076B2Jul 27, 2010
Allocating processing units to processing clusters to generate simulated diffraction signals
TOKYO ELECTRON LTD0 citations40
US7765234B2Jul 27, 2010
Data flow management in generating different signal formats used in optical metrology
TOKYO ELECTRON LTD0 citations40
US7742888B2Jun 22, 2010
Allocating processing units to generate simulated diffraction signals used in optical metrology
TOKYO ELECTRON LTD0 citations40