P

Inventor

LIN SHIAN-JYH

TW55 patents
⚠️ This page may combine multiple inventors who share the name “LIN SHIAN-JYH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NANYA TECHNOLOGY CORP

45 patents
US6808979B1Oct 26, 2004

Method for forming vertical transistor and trench capacitor

NANYA TECHNOLOGY CORP81 citations98
US6716757B2Apr 6, 2004

Method for forming bottle trenches

NANYA TECHNOLOGY CORP36 citations92
US7679137B2Mar 16, 2010

Method for fabricating recessed gate MOS transistor device

NANYA TECHNOLOGY CORP8 citations84
US7465622B2Dec 16, 2008

Method for making a raised vertical channel transistor device

NANYA TECHNOLOGY CORP15 citations84
US7449382B2Nov 11, 2008

Memory device and fabrication method thereof

NANYA TECHNOLOGY CORP9 citations83
US6696344B1Feb 24, 2004

Method for forming a bottle-shaped trench

NANYA TECHNOLOGY CORP13 citations83
US7078307B2Jul 18, 2006

Method for manufacturing single-sided buried strap in semiconductor devices

NANYA TECHNOLOGY CORP15 citations82
US6977227B2Dec 20, 2005

Method of etching bottle trench and fabricating capacitor with same

NANYA TECHNOLOGY CORP18 citations82
US7911028B2Mar 22, 2011

Semiconductor device and method of manufacturing the same

NANYA TECHNOLOGY CORP9 citations81
US6989561B2Jan 24, 2006

Trench capacitor structure

NANYA TECHNOLOGY CORP15 citations80
US7579234B2Aug 25, 2009

Method for fabricating memory device with recess channel MOS transistor

NANYA TECHNOLOGY CORP6 citations74
US11456303B2Sep 27, 2022

Fuse array structure

NANYA TECHNOLOGY CORP3 citations73
US11114441B1Sep 7, 2021

Semiconductor memory device

NANYA TECHNOLOGY CORP4 citations73
US10818592B1Oct 27, 2020

Semiconductor memory device including decoupling capacitor array arranged overlying one-time programmable device

NANYA TECHNOLOGY CORP4 citations73
US6992021B2Jan 31, 2006

Method for forming a silicon nitride layer

NANYA TECHNOLOGY CORP8 citations73
US6767786B1Jul 27, 2004

Method for forming bottle trenches by liquid phase oxide deposition

NANYA TECHNOLOGY CORP12 citations73
US6417064B1Jul 9, 2002

Method for treating the surface of a deep trench

NANYA TECHNOLOGY CORP7 citations73
US7094672B2Aug 22, 2006

Method for forming self-aligned contact in semiconductor device

NANYA TECHNOLOGY CORP8 citations72
US5923989AJul 13, 1999

Method of fabricating rugged capacitor of high density DRAMs

NANYA TECHNOLOGY CORP12 citations71
US7943513B2May 17, 2011

Conductive through connection and forming method thereof

NANYA TECHNOLOGY CORP5 citations63
US7932555B2Apr 26, 2011

Transistor structure and method of making the same

NANYA TECHNOLOGY CORP4 citations63
US7592229B2Sep 22, 2009

Method for fabricating a recessed-gate MOS transistor device

NANYA TECHNOLOGY CORP4 citations63
US7030431B2Apr 18, 2006

Metal gate with composite film stack

NANYA TECHNOLOGY CORP2 citations63
US6620689B2Sep 16, 2003

Method of fabricating a flash memory cell using angled implant

NANYA TECHNOLOGY CORP3 citations63
US6566192B2May 20, 2003

Method of fabricating a trench capacitor of a memory cell

NANYA TECHNOLOGY CORP5 citations63
US7985998B2Jul 26, 2011

Trench-type semiconductor device structure

NANYA TECHNOLOGY CORP2 citations62
US7795090B2Sep 14, 2010

Electrical device and method for fabricating the same

NANYA TECHNOLOGY CORP3 citations62
US7638391B2Dec 29, 2009

Semiconductor memory device and fabrication method thereof

NANYA TECHNOLOGY CORP3 citations62
US7446355B2Nov 4, 2008

Electrical device and method for fabricating the same

NANYA TECHNOLOGY CORP2 citations62
US7094658B2Aug 22, 2006

3-stage method for forming deep trench structure and deep trench capacitor

NANYA TECHNOLOGY CORP4 citations62
US10692811B1Jun 23, 2020

Semiconductor structure

NANYA TECHNOLOGY CORP1 citations61
US7160804B2Jan 9, 2007

Method of fabricating MOS transistor by millisecond anneal

NANYA TECHNOLOGY CORP2 citations61
US7510930B2Mar 31, 2009

Method for fabricating recessed gate MOS transistor device

NANYA TECHNOLOGY CORP2 citations59
US7803701B2Sep 28, 2010

Method for fabricating a semiconductor device

NANYA TECHNOLOGY CORP2 citations58
US6821843B1Nov 23, 2004

Fabrication method for an array area and a support area of a dynamic random access memory

NANYA TECHNOLOGY CORP6 citations57
US7144462B2Dec 5, 2006

Adjustable detection apparatus

NANYA TECHNOLOGY CORP2 citations55
US10825823B1Nov 3, 2020

Semiconductor memory device including decoupling capacitor array arranged overlying one-time programmable device

NANYA TECHNOLOGY CORP0 citations52
US9214571B2Dec 15, 2015

Semiconductor device capable of reducing influences of adjacent word lines or adjacent transistors and fabricating method thereof

NANYA TECHNOLOGY CORP0 citations52
US7700435B2Apr 20, 2010

Method for fabricating deep trench DRAM array

NANYA TECHNOLOGY CORP0 citations52
US7675109B2Mar 9, 2010

Raised vertical channel transistor device

NANYA TECHNOLOGY CORP0 citations52
US7622381B2Nov 24, 2009

Semiconductor structure and the forming method thereof

NANYA TECHNOLOGY CORP0 citations52
US7923325B2Apr 12, 2011

Deep trench device with single sided connecting structure and fabrication method thereof

NANYA TECHNOLOGY CORP0 citations51
US7619271B2Nov 17, 2009

Deep trench device with single sided connecting structure and fabrication method thereof

NANYA TECHNOLOGY CORP0 citations51
US7205075B2Apr 17, 2007

Method of forming a vertical memory device with a rectangular trench

NANYA TECHNOLOGY CORP0 citations49
US6867091B1Mar 15, 2005

Method for forming deep trench capacitor with liquid phase deposition oxide as collar oxide

NANYA TECHNOLOGY CORP1 citations48

LIN SHIAN-JYH

4 patents

HUANG CHIH-WEI

1 patent

Showing the top 50 of 55 patents by PatentIndex Score.