Inventor
HAYWOOD EDWARD
US21 patents
⚠️ This page may combine multiple inventors who share the name “HAYWOOD EDWARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTERMOLECULAR INC
6 patentsUS7927947B2Apr 19, 2011
Methods for depositing high-K dielectrics
INTERMOLECULAR INC10 citations84
US7968452B2Jun 28, 2011
Titanium-based high-K dielectric films
INTERMOLECULAR INC6 citations73
US8829647B2Sep 9, 2014
High temperature ALD process for metal oxide for DRAM applications
INTERMOLECULAR INC2 citations63
US8901708B2Dec 2, 2014
Yttrium and titanium high-k dielectric films
INTERMOLECULAR INC2 citations62
US8900418B2Dec 2, 2014
Yttrium and titanium high-k dielectric films
INTERMOLECULAR INC0 citations52
US8859301B2Oct 14, 2014
System and method for step coverage measurement
INTERMOLECULAR INC0 citations52
APPLIED MATERIALS INC
6 patentsUS11557466B2Jan 17, 2023
Tuneable uniformity control utilizing rotational magnetic housing
APPLIED MATERIALS INC2 citations71
US12555741B2Feb 17, 2026
Magnetic housing systems
APPLIED MATERIALS INC0 citations61
US11587764B2Feb 21, 2023
Magnetic housing systems
APPLIED MATERIALS INC1 citations61
US11189517B2Nov 30, 2021
RF electrostatic chuck filter circuit
APPLIED MATERIALS INC0 citations61
US11560626B2Jan 24, 2023
Substrate processing chamber
APPLIED MATERIALS INC0 citations60
US12068153B2Aug 20, 2024
Situ clean for bevel and edge ring
APPLIED MATERIALS INC0 citations47
CHEN HANHONG
4 patentsUS8809160B2Aug 19, 2014
Methods for forming high-K crystalline films and related devices
CHEN HANHONG4 citations73
US8486727B2Jul 16, 2013
System and method for step coverage measurement
CHEN HANHONG3 citations62
US8551851B2Oct 8, 2013
Titanium-based high-K dielectric films
CHEN HANHONG2 citations61
US8530322B2Sep 10, 2013
Method of forming stacked metal oxide layers
CHEN HANHONG0 citations52