Inventor
VARANASI PUSHKARA RAO
US33 patents
⚠️ This page may combine multiple inventors who share the name “VARANASI PUSHKARA RAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
24 patentsUS6949325B2Sep 27, 2005
Negative resist composition with fluorosulfonamide-containing polymer
IBM91 citations98
US7063931B2Jun 20, 2006
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM27 citations93
US6756180B2Jun 29, 2004
Cyclic olefin-based resist compositions having improved image stability
IBM19 citations93
US6635401B2Oct 21, 2003
Resist compositions with polymers having 2-cyano acrylic monomer
IBM31 citations93
US6627391B1Sep 30, 2003
Resist compositions containing lactone additives
IBM30 citations93
US7335456B2Feb 26, 2008
Top coat material and use thereof in lithography processes
IBM37 citations92
US7320855B2Jan 22, 2008
Silicon containing TARC/barrier layer
IBM37 citations92
US6818381B2Nov 16, 2004
Underlayer compositions for multilayer lithographic processes
IBM21 citations92
US6534239B2Mar 18, 2003
Resist compositions with polymers having pendant groups containing plural acid labile moieties
IBM21 citations92
US6124074ASep 26, 2000
Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives
IBM29 citations92
US6251560B1Jun 26, 2001
Photoresist compositions with cyclic olefin polymers having lactone moiety
IBM20 citations91
US6770419B2Aug 3, 2004
Low silicon-outgassing resist for bilayer lithography
IBM14 citations83
US7217496B2May 15, 2007
Fluorinated photoresist materials with improved etch resistant properties
IBM15 citations82
US6902874B2Jun 7, 2005
Resist compositions with polymers having 2-cyano acrylic monomer
IBM7 citations74
US6696216B2Feb 24, 2004
Thiophene-containing photo acid generators for photolithography
IBM8 citations74
US6391521B1May 21, 2002
Resist compositions containing bulky anhydride additives
IBM10 citations74
US6927015B2Aug 9, 2005
Underlayer compositions for multilayer lithographic processes
IBM10 citations73
US6562554B1May 13, 2003
Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives
IBM6 citations73
US7700262B2Apr 20, 2010
Top coat material and use thereof in lithography processes
IBM4 citations63
US7651831B2Jan 26, 2010
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM2 citations63
US7638264B2Dec 29, 2009
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
IBM3 citations63
US7183036B2Feb 27, 2007
Low activation energy positive resist
IBM6 citations63
US7129016B2Oct 31, 2006
Positive resist containing naphthol functionality
IBM4 citations63
US6770418B2Aug 3, 2004
Positive resist compositions containing non-polymeric silicon
IBM1 citations51
HUANG WU-SONG
4 patentsUS8546062B2Oct 1, 2013
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
HUANG WU-SONG7 citations82
US8182978B2May 22, 2012
Developable bottom antireflective coating compositions especially suitable for ion implant applications
HUANG WU-SONG4 citations62
US8097401B2Jan 17, 2012
Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
HUANG WU-SONG4 citations60
US8557501B2Oct 15, 2013
Developable bottom antireflective coating compositions especially suitable for ion implant applications
HUANG WU-SONG0 citations51