P

Inventor

JOSLYN MICHAEL J

US13 patents

Patents

13 patents
US6203404B1Mar 20, 2001

Chemical mechanical polishing methods

MICRON TECHNOLOGY INC136 citations98
US6592443B1Jul 15, 2003

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

MICRON TECHNOLOGY INC85 citations97
US6533893B2Mar 18, 2003

Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids

MICRON TECHNOLOGY INC72 citations96
US6383934B1May 7, 2002

Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids

MICRON TECHNOLOGY INC73 citations96
US6722943B2Apr 20, 2004

Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces

MICRON TECHNOLOGY INC48 citations95
US7192336B2Mar 20, 2007

Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

MICRON TECHNOLOGY INC19 citations92
US6605159B2Aug 12, 2003

Device and method for collecting and measuring chemical samples on pad surface in CMP

MICRON TECHNOLOGY INC17 citations92
US6475071B1Nov 5, 2002

Cross flow slurry filtration apparatus and method

MICRON TECHNOLOGY INC37 citations92
US6837942B2Jan 4, 2005

Device and method for collecting and measuring chemical samples pad surface in CMP

MICRON TECHNOLOGY INC5 citations73
US6595832B2Jul 22, 2003

Chemical mechanical polishing methods

MICRON TECHNOLOGY INC5 citations73
US7210989B2May 1, 2007

Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces

MICRON TECHNOLOGY INC2 citations62
US7223154B2May 29, 2007

Method for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates

MICRON TECHNOLOGY INC0 citations52
US6413834B1Jul 2, 2002

Methods for etching silicon dioxide; and methods for forming isolation regions

MICRON TECHNOLOGY INC0 citations51