P

Inventor

WATABE YOSHIMI

JP9 patents
⚠️ This page may combine multiple inventors who share the name “WATABE YOSHIMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ANELVA CORP

3 patents
US6189485B1Feb 20, 2001

Plasma CVD apparatus suitable for manufacturing solar cell and the like

ANELVA CORP81 citations96
US5437895AAug 1, 1995

Plasma CVD process for forming amorphous silicon thin film

ANELVA CORP31 citations92
US6664496B2Dec 16, 2003

Plasma processing system

ANELVA CORP13 citations83

NEC CORP

2 patents
US6861614B1Mar 1, 2005

S system for the formation of a silicon thin film and a semiconductor-insulating film interface

NEC CORP156 citations97
US7312418B2Dec 25, 2007

Semiconductor thin film forming system

NEC CORP32 citations91

NAT INST OF ADVANCED IND SCIEN

1 patent
US6503816B2Jan 7, 2003

Thin film formation by inductively-coupled plasma CVD process

NAT INST OF ADVANCED IND SCIEN24 citations92

CANON ANELVA CORP

1 patent
US7530359B2May 12, 2009

Plasma treatment system and cleaning method of the same

CANON ANELVA CORP4 citations61

SANYO ELECTRIC CO

1 patent
US8002947B2Aug 23, 2011

Plasma treatment system and cleaning method of the same

SANYO ELECTRIC CO0 citations51

ISHIKAWAJIMA HARIMA HEAVY IND

1 patent
US7913752B2Mar 29, 2011

Cooling device for vacuum treatment device

ISHIKAWAJIMA HARIMA HEAVY IND0 citations40