Inventor
BURGHOORN JACOBUS
NL18 patents
⚠️ This page may combine multiple inventors who share the name “BURGHOORN JACOBUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
15 patentsUS7880880B2Feb 1, 2011
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV24 citations95
US6507388B2Jan 14, 2003
Interferometric alignment system for use in vacuum-based lithographic apparatus
ASML NETHERLANDS BV52 citations95
US7332732B2Feb 19, 2008
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV22 citations94
US7385675B2Jun 10, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV18 citations92
US7329888B2Feb 12, 2008
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV18 citations91
US7297971B2Nov 20, 2007
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV12 citations91
US7629697B2Dec 8, 2009
Marker structure and method for controlling alignment of layers of a multi-layered substrate
ASML NETHERLANDS BV10 citations83
US7576834B2Aug 18, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV7 citations73
US7439531B2Oct 21, 2008
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV7 citations71
US8675175B2Mar 18, 2014
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations62
US6876436B2Apr 5, 2005
Interferometric alignment system for use in vacuum-based lithographic apparatus
ASML NETHERLANDS BV4 citations62
US7834975B2Nov 16, 2010
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
ASML NETHERLANDS BV2 citations61
US7518706B2Apr 14, 2009
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly
ASML NETHERLANDS BV5 citations61
US7879682B2Feb 1, 2011
Marker structure and method for controlling alignment of layers of a multi-layered substrate
ASML NETHERLANDS BV2 citations59
US7476490B2Jan 13, 2009
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations52