Inventor
LEE JOOHO
KR69 patents
⚠️ This page may combine multiple inventors who share the name “LEE JOOHO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
42 patentsUS12087810B2Sep 10, 2024
Capacitor and electronic device including the same
SAMSUNG ELECTRONICS CO LTD2 citations73
US11227912B2Jan 18, 2022
Integrated circuit device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations73
US11641730B2May 2, 2023
Semiconductor memory devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD2 citations72
US11239239B2Feb 1, 2022
Semiconductor memory devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD2 citations72
US9970906B2May 15, 2018
Apparatus for analyzing active material of secondary battery and method of analyzing active material using the same
SAMSUNG ELECTRONICS CO LTD6 citations70
US9722068B2Aug 1, 2017
Semiconductor devices and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations70
US11133179B2Sep 28, 2021
Thin-film structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations68
US12588438B2Mar 24, 2026
Layer structures including dielectric layer, methods of manufacturing dielectric layer, electronic device including dielectric layer, and electronic apparatus including electronic device
SAMSUNG ELECTRONICS CO LTD0 citations62
US12538505B2Jan 27, 2026
Capacitor and electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12532487B2Jan 20, 2026
Capacitor and electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12513919B2Dec 30, 2025
Method of manufacturing metal nitride film and electronic device including metal nitride film
SAMSUNG ELECTRONICS CO LTD0 citations62
US12488940B2Dec 2, 2025
Electronic device including dielectric layer and method of manufacturing the electronic device
SAMSUNG ELECTRONICS CO LTD0 citations62
US12446239B2Oct 14, 2025
Capacitor, method of fabricating the capacitor, and electronic device including the capacitor
SAMSUNG ELECTRONICS CO LTD0 citations62
US12356643B2Jul 8, 2025
Capacitor, memory device including the capacitor
SAMSUNG ELECTRONICS CO LTD0 citations62
US12349373B2Jul 1, 2025
Integrated circuit device
SAMSUNG ELECTRONICS CO LTD0 citations62
US12308365B2May 20, 2025
Thin film structure including method of manufacturing
SAMSUNG ELECTRONICS CO LTD0 citations62
US12082395B2Sep 3, 2024
Semiconductor memory devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11980023B2May 7, 2024
Capacitor, method of controlling the same, and transistor including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11810946B2Nov 7, 2023
Integrated circuit device including capacitor with metal nitrate interfacial layer
SAMSUNG ELECTRONICS CO LTD0 citations62
US11798980B2Oct 24, 2023
Integrated circuit device and electronic device including capacitor with interfacial layer containing metal element, other element, nitrogen, and oxygen
SAMSUNG ELECTRONICS CO LTD0 citations62
US11778805B2Oct 3, 2023
Semiconductor memory devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11765887B2Sep 19, 2023
Capacitor, method of controlling the same, and transistor including the same
SAMSUNG ELECTRONICS CO LTD1 citations62
US11424317B2Aug 23, 2022
Method of manufacturing metal nitride film and electronic device including metal nitride film
SAMSUNG ELECTRONICS CO LTD0 citations62
US11257899B2Feb 22, 2022
Film structure including hafnium oxide, electronic device including the same, and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12501631B2Dec 16, 2025
Capacitor, and device comprising the same, and method of preparing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12414313B2Sep 9, 2025
High-K capacitor dielectric having a metal oxide area comprising boron, electrical device and semiconductor apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12408353B2Sep 2, 2025
Device with dielectric metal oxide layers and semiconductor apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12278260B2Apr 15, 2025
Capacitor and semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12276026B2Apr 15, 2025
Thin film structure including dielectric material layer, method of manufacturing the same, and electronic device employing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12191348B2Jan 7, 2025
Capacitors of semiconductor device capable of operating in high frequency operation environment
SAMSUNG ELECTRONICS CO LTD0 citations61
US12071690B2Aug 27, 2024
Thin film structure including dielectric material layer, and method of manufacturing the same, and electronic device employing the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US12051717B2Jul 30, 2024
Anti-ferroelectric thin-film structure and electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12034036B2Jul 9, 2024
Semiconductor device and semiconductor apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11935916B2Mar 19, 2024
Dielectric thin-film structure and electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11908887B2Feb 20, 2024
Capacitor and semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11869926B2Jan 9, 2024
High-k capacitor dielectric having a metal oxide area comprising boron, electrical device, and semiconductor apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11817475B2Nov 14, 2023
Semiconductor device and semiconductor apparatus including the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US11791372B2Oct 17, 2023
Capacitors of semiconductor device capable of operating in high frequency operation environment
SAMSUNG ELECTRONICS CO LTD1 citations61
US11761089B2Sep 19, 2023
Thin film structure including dielectric material layer, method of manufacturing the same, and electronic device employing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11658024B2May 23, 2023
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11569341B2Jan 31, 2023
Dielectric thin-film structure and electronic device including the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US10438715B2Oct 8, 2019
Nanostructure, method of preparing the same, and panel units comprising the nanostructure
SAMSUNG ELECTRONICS CO LTD1 citations60
AIR LIQUIDE
5 patentsUS10174423B2Jan 8, 2019
Niobium-containing film forming compositions and vapor deposition of Niobium-containing films
AIR LIQUIDE5 citations72
US10023462B2Jul 17, 2018
Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride films
AIR LIQUIDE4 citations72
US12398275B2Aug 26, 2025
Group V element-containing film compositions and vapor deposition of Group V element-containing film
AIR LIQUIDE0 citations62
US12371787B2Jul 29, 2025
Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturing
AIR LIQUIDE0 citations62
US12312677B2May 27, 2025
Step coverage using an inhibitor molecule for high aspect ratio structures
AIR LIQUIDE0 citations62
NDSP CORP
2 patentsTMAXDATA CO LTD
1 patentShowing the top 50 of 69 patents by PatentIndex Score.