Inventor
KLUTH GEORGE JONATHAN
US15 patents
⚠️ This page may combine multiple inventors who share the name “KLUTH GEORGE JONATHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
14 patentsUS6797602B1Sep 28, 2004
Method of manufacturing a semiconductor device with supersaturated source/drain extensions and metal silicide contacts
ADVANCED MICRO DEVICES INC113 citations98
US6777275B1Aug 17, 2004
Single anneal for dopant activation and silicide formation
ADVANCED MICRO DEVICES INC72 citations97
US6724051B1Apr 20, 2004
Nickel silicide process using non-reactive spacer
ADVANCED MICRO DEVICES INC24 citations92
US6521515B1Feb 18, 2003
Deeply doped source/drains for reduction of silicide/silicon interface roughness
ADVANCED MICRO DEVICES INC37 citations92
US6451693B1Sep 17, 2002
Double silicide formation in polysicon gate without silicide in source/drain extensions
ADVANCED MICRO DEVICES INC48 citations92
US6410388B1Jun 25, 2002
Process for optimizing pocket implant profile by RTA implant annealing for a non-volatile semiconductor device
ADVANCED MICRO DEVICES INC39 citations92
US6380057B1Apr 30, 2002
Enhancement of nickel silicide formation by use of nickel pre-amorphizing implant
ADVANCED MICRO DEVICES INC34 citations92
US6362095B1Mar 26, 2002
Nickel silicide stripping after nickel silicide formation
ADVANCED MICRO DEVICES INC17 citations84
US6605513B2Aug 12, 2003
Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing
ADVANCED MICRO DEVICES INC16 citations83
US6562717B1May 13, 2003
Semiconductor device having multiple thickness nickel silicide layers
ADVANCED MICRO DEVICES INC12 citations74
US6387767B1May 14, 2002
Nitrogen-rich silicon nitride sidewall spacer deposition
ADVANCED MICRO DEVICES INC13 citations74
US6544872B1Apr 8, 2003
Dopant implantation processing for improved source/drain interface with metal silicides
ADVANCED MICRO DEVICES INC4 citations63
US6372673B1Apr 16, 2002
Silicon-starved nitride spacer deposition
ADVANCED MICRO DEVICES INC6 citations63
US7504326B2Mar 17, 2009
Use of scanning theme implanters and annealers for selective implantation and annealing
ADVANCED MICRO DEVICES INC1 citations42