Inventor
BAN COZY
JP19 patents
⚠️ This page may combine multiple inventors who share the name “BAN COZY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
17 patentsUS6001215ADec 14, 1999
Semiconductor nitride film etching system
MITSUBISHI ELECTRIC CORP104 citations98
US5216890AJun 8, 1993
Device for and method of producing hyperfine frozen particles
MITSUBISHI ELECTRIC CORP65 citations96
US6145519ANov 14, 2000
Semiconductor workpiece cleaning method and apparatus
MITSUBISHI ELECTRIC CORP67 citations95
US5380471AJan 10, 1995
Aeration apparatus for producing ultrapure water
MITSUBISHI ELECTRIC CORP75 citations94
US6227212B1May 8, 2001
Semiconductor workpiece cleaning method and apparatus
MITSUBISHI ELECTRIC CORP20 citations92
US6032382AMar 7, 2000
Drying apparatus and method using IPA of a semiconductor wafer
MITSUBISHI ELECTRIC CORP33 citations92
US5336356AAug 9, 1994
Apparatus for treating the surface of a semiconductor substrate
MITSUBISHI ELECTRIC CORP55 citations92
US5246586ASep 21, 1993
Apparatus and method for producing ultrapure water and method of controlling the apparatus
MITSUBISHI ELECTRIC CORP32 citations92
US6562205B1May 13, 2003
High-temperature ultrapure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus
MITSUBISHI ELECTRIC CORP19 citations91
US6431183B1Aug 13, 2002
Method for treating semiconductor substrates
MITSUBISHI ELECTRIC CORP21 citations91
US6131052AOct 10, 2000
Semiconductor manufacturing non-processing apparatuses with storage equipment
MITSUBISHI ELECTRIC CORP29 citations91
US5470461ANov 28, 1995
Apparatus for producing pure water
MITSUBISHI ELECTRIC CORP35 citations90
US5554295ASep 10, 1996
Method for producing pure water
MITSUBISHI ELECTRIC CORP16 citations80
US5468350ANov 21, 1995
Apparatus for manufacturing ultrapure water
MITSUBISHI ELECTRIC CORP10 citations74
US5344615ASep 6, 1994
Wet-process apparatus
MITSUBISHI ELECTRIC CORP7 citations73
US6410454B1Jun 25, 2002
Method and apparatus for removing contaminants from the surface of a semiconductor wafer
MITSUBISHI ELECTRIC CORP13 citations68
US6221771B1Apr 24, 2001
Method of forming tungsten silicide film, method of fabricating semiconductor devices and semiconductor manufactured thereby
MITSUBISHI ELECTRIC CORP5 citations63