P

Inventor

BAN COZY

JP19 patents
⚠️ This page may combine multiple inventors who share the name “BAN COZY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

17 patents
US6001215ADec 14, 1999

Semiconductor nitride film etching system

MITSUBISHI ELECTRIC CORP104 citations98
US5216890AJun 8, 1993

Device for and method of producing hyperfine frozen particles

MITSUBISHI ELECTRIC CORP65 citations96
US6145519ANov 14, 2000

Semiconductor workpiece cleaning method and apparatus

MITSUBISHI ELECTRIC CORP67 citations95
US5380471AJan 10, 1995

Aeration apparatus for producing ultrapure water

MITSUBISHI ELECTRIC CORP75 citations94
US6227212B1May 8, 2001

Semiconductor workpiece cleaning method and apparatus

MITSUBISHI ELECTRIC CORP20 citations92
US6032382AMar 7, 2000

Drying apparatus and method using IPA of a semiconductor wafer

MITSUBISHI ELECTRIC CORP33 citations92
US5336356AAug 9, 1994

Apparatus for treating the surface of a semiconductor substrate

MITSUBISHI ELECTRIC CORP55 citations92
US5246586ASep 21, 1993

Apparatus and method for producing ultrapure water and method of controlling the apparatus

MITSUBISHI ELECTRIC CORP32 citations92
US6562205B1May 13, 2003

High-temperature ultrapure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus

MITSUBISHI ELECTRIC CORP19 citations91
US6431183B1Aug 13, 2002

Method for treating semiconductor substrates

MITSUBISHI ELECTRIC CORP21 citations91
US6131052AOct 10, 2000

Semiconductor manufacturing non-processing apparatuses with storage equipment

MITSUBISHI ELECTRIC CORP29 citations91
US5470461ANov 28, 1995

Apparatus for producing pure water

MITSUBISHI ELECTRIC CORP35 citations90
US5554295ASep 10, 1996

Method for producing pure water

MITSUBISHI ELECTRIC CORP16 citations80
US5468350ANov 21, 1995

Apparatus for manufacturing ultrapure water

MITSUBISHI ELECTRIC CORP10 citations74
US5344615ASep 6, 1994

Wet-process apparatus

MITSUBISHI ELECTRIC CORP7 citations73
US6410454B1Jun 25, 2002

Method and apparatus for removing contaminants from the surface of a semiconductor wafer

MITSUBISHI ELECTRIC CORP13 citations68
US6221771B1Apr 24, 2001

Method of forming tungsten silicide film, method of fabricating semiconductor devices and semiconductor manufactured thereby

MITSUBISHI ELECTRIC CORP5 citations63

RYODEN SEMICONDUCTOR SYST ENG

2 patents