Inventor
MIYABE MASANORI
US6 patents
Patents
6 patentsUS4731319AMar 15, 1988
Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins
TOKYO OHKA KOGYO CO LTD48 citations92
US5057397AOct 15, 1991
Electron beam-curable resist composition and method for fine patterning using the same
TOKYO OHKA KOGYO CO LTD20 citations81
US4882260ANov 21, 1989
Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
TOKYO OHKA KOGYO CO LTD19 citations81
US5180653AJan 19, 1993
Electron beam-curable resist composition and method for fine patterning using the same
TOKYO OHKA KOGYO CO LTD10 citations73
US4906549AMar 6, 1990
Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms
TOKYO OHKA KOGYO CO LTD15 citations73
US5281508AJan 25, 1994
Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol
TOKYO OHKA KOGYO CO LTD4 citations62