Inventor
OGURO DAI
JP23 patents
⚠️ This page may combine multiple inventors who share the name “OGURO DAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI GAS CHEMICAL CO
9 patentsUS6447859B2Sep 10, 2002
Polyester resin and molded article
MITSUBISHI GAS CHEMICAL CO23 citations92
US7871751B2Jan 18, 2011
Resist composition
MITSUBISHI GAS CHEMICAL CO15 citations84
US7067186B2Jun 27, 2006
Thermoplastic resin composition
MITSUBISHI GAS CHEMICAL CO10 citations73
US6740376B2May 25, 2004
Polyester based resin composition and molded product therefrom
MITSUBISHI GAS CHEMICAL CO10 citations73
US8350096B2Jan 8, 2013
Compound for resist and radiation-sensitive composition
MITSUBISHI GAS CHEMICAL CO1 citations62
US7919223B2Apr 5, 2011
Compound for resist and radiation-sensitive composition
MITSUBISHI GAS CHEMICAL CO3 citations62
US9897913B2Feb 20, 2018
Radiation-sensitive composition
MITSUBISHI GAS CHEMICAL CO0 citations52
US9605110B2Mar 28, 2017
Epoxy resin curing agent
MITSUBISHI GAS CHEMICAL CO0 citations52
US9234986B2Jan 12, 2016
Polyester resin and optical lens
MITSUBISHI GAS CHEMICAL CO0 citations50
ECHIGO MASATOSHI
4 patentsUS8110334B2Feb 7, 2012
Radiation-sensitive composition
ECHIGO MASATOSHI13 citations83
US8846292B2Sep 30, 2014
Radiation-sensitive composition
ECHIGO MASATOSHI2 citations62
US9150491B2Oct 6, 2015
Bicyclohexane derivative compound and manufacturing method of the same
ECHIGO MASATOSHI0 citations51
US8802353B2Aug 12, 2014
Compound for resist and radiation-sensitive composition specification
ECHIGO MASATOSHI1 citations51
MINEZAKI TAKUYA
3 patentsUS8859787B2Oct 14, 2014
Glycol compound having dioxane structure and method for producing the same
MINEZAKI TAKUYA0 citations48
US8846957B2Sep 30, 2014
Glycol compound having dioxane structure and method for producing the same
MINEZAKI TAKUYA0 citations48
US8674054B2Mar 18, 2014
Polyester resin and optical lens
MINEZAKI TAKUYA0 citations48
KITA SEIJI
3 patentsUS8563665B2Oct 22, 2013
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
KITA SEIJI0 citations47
US8524952B2Sep 3, 2013
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
KITA SEIJI0 citations47
US8519177B2Aug 27, 2013
Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound
KITA SEIJI0 citations47
HAYASHI HIROMI
2 patentsUS8748078B2Jun 10, 2014
Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
HAYASHI HIROMI6 citations70
US8829247B2Sep 9, 2014
Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
HAYASHI HIROMI3 citations60