Inventor
ASHTIANI KAIHAN
US16 patents
⚠️ This page may combine multiple inventors who share the name “ASHTIANI KAIHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
5 patentsUS8367546B2Feb 5, 2013
Methods for forming all tungsten contacts and lines
NOVELLUS SYSTEMS INC42 citations98
US8053365B2Nov 8, 2011
Methods for forming all tungsten contacts and lines
NOVELLUS SYSTEMS INC66 citations98
US7955972B2Jun 7, 2011
Methods for growing low-resistivity tungsten for high aspect ratio and small features
NOVELLUS SYSTEMS INC87 citations97
US6342133B2Jan 29, 2002
PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter
NOVELLUS SYSTEMS INC92 citations91
US9299559B2Mar 29, 2016
Flowable oxide film with tunable wet etch rate
NOVELLUS SYSTEMS INC10 citations82
LAM RES CORP
5 patentsUS10262943B2Apr 16, 2019
Interlevel conductor pre-fill utilizing selective barrier deposition
LAM RES CORP7 citations83
US9583386B2Feb 28, 2017
Interlevel conductor pre-fill utilizing selective barrier deposition
LAM RES CORP8 citations83
US9875968B2Jan 23, 2018
Interlevel conductor pre-fill utilizing selective barrier deposition
LAM RES CORP2 citations72
US9406544B1Aug 2, 2016
Systems and methods for eliminating seams in atomic layer deposition of silicon dioxide film in gap fill applications
LAM RES CORP2 citations62
US10895539B2Jan 19, 2021
In-situ chamber clean end point detection systems and methods using computer vision systems
LAM RES CORP1 citations59
CHANDRASHEKAR ANAND
2 patentsUS8058170B2Nov 15, 2011
Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
CHANDRASHEKAR ANAND83 citations95
US8409987B2Apr 2, 2013
Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
CHANDRASHEKAR ANAND34 citations91