Inventor
KIM BYUNG-GOOK
KR30 patents
⚠️ This page may combine multiple inventors who share the name “KIM BYUNG-GOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
21 patentsUS10437145B2Oct 8, 2019
Method of detaching a pellicle from a photomask
SAMSUNG ELECTRONICS CO LTD4 citations72
US10065402B2Sep 4, 2018
Method of manufacturing pellicle assembly and method of photomask assembly including the same
SAMSUNG ELECTRONICS CO LTD5 citations72
US9880462B2Jan 30, 2018
Pellicle and exposure mask including the same
SAMSUNG ELECTRONICS CO LTD3 citations72
US9690190B2Jun 27, 2017
Pellicles and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations72
US9892500B2Feb 13, 2018
Method for grouping region of interest of mask pattern and measuring critical dimension of mask pattern using the same
SAMSUNG ELECTRONICS CO LTD4 citations71
US10430083B2Oct 1, 2019
Memory scheduling method for changing command order and method of operating memory system
SAMSUNG ELECTRONICS CO LTD2 citations70
US10073337B2Sep 11, 2018
Pellicle and photomask assembly including the same
SAMSUNG ELECTRONICS CO LTD5 citations70
US10114555B2Oct 30, 2018
Semiconductor device having register sets and data processing device including the same
SAMSUNG ELECTRONICS CO LTD4 citations69
US7763397B2Jul 27, 2010
Photomask registration errors of which have been corrected and method of correcting registration errors of photomask
SAMSUNG ELECTRONICS CO LTD5 citations61
US7369254B2May 6, 2008
System and method for measuring dimension of patterns formed on photomask
SAMSUNG ELECTRONICS CO LTD3 citations60
US11302540B2Apr 12, 2022
Substrate support device and substrate cleaning device including the same
SAMSUNG ELECTRONICS CO LTD0 citations59
US11381388B2Jul 5, 2022
Storage device sharing data encryption key as encrypted and operating method of storage device
SAMSUNG ELECTRONICS CO LTD1 citations56
US11415889B2Aug 16, 2022
Chemical supply structure and a developing apparatus having the same
SAMSUNG ELECTRONICS CO LTD0 citations54
US10444619B2Oct 15, 2019
Mask blank and phase shift mask using same
SAMSUNG ELECTRONICS CO LTD0 citations49
US10114552B2Oct 30, 2018
Memory scheduling method for changing command order and method of operating memory system
SAMSUNG ELECTRONICS CO LTD1 citations49
US10042246B2Aug 7, 2018
Method of manufacturing photomask
SAMSUNG ELECTRONICS CO LTD0 citations48
US9897554B2Feb 20, 2018
Method of inspecting surface and method of inspecting photomask using the same
SAMSUNG ELECTRONICS CO LTD1 citations48
US9798241B2Oct 24, 2017
Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices
SAMSUNG ELECTRONICS CO LTD1 citations48
US9417518B2Aug 16, 2016
Photomask and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations48
US10217635B2Feb 26, 2019
Method of manufacturing semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations47
US7939223B2May 10, 2011
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
SAMSUNG ELECTRONICS CO LTD0 citations40
CHOI JIN
4 patentsUS8817234B2Aug 26, 2014
Optical device and exposure apparatus including the same
CHOI JIN0 citations51
US8673522B2Mar 18, 2014
Method for manufacturing photomask and photomask manufactured using the same
CHOI JIN0 citations51
US8475980B2Jul 2, 2013
Methods of forming semiconductor devices using photolithographic shot grouping
CHOI JIN1 citations51
US8329381B2Dec 11, 2012
Pattern forming method
CHOI JIN0 citations51