Inventor

FUKASAWA MASANAGA

JP19 patents

⚠️ This page may combine multiple inventors who share the name “FUKASAWA MASANAGA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUKASAWA MASANAGA

SONY CORP

Low dielectric constant insulating films with laminated carbon-containing silicon oxide and organic layers

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Semiconductor device and solid-state imaging device

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Method of etching insulating film and method of forming interconnection layer

Semiconductor device and solid-state imaging device

Damascene interconnection having porous low k layer with a hard mask reduced in thickness

Method of etching insulating film and method of forming interconnection layer

Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing process

SONY SEMICONDUCTOR SOLUTIONS CORP

Etching method and etching processing apparatus

Etching method of oxide semiconductor film, oxide semiconductor workpiece, and electronic device

Etching method for oxide semiconductor film

Solid-state imaging device and method for manufacturing the same

FUKASAWA MASANAGA

Semiconductor device and manufacturing method of the same

NOGAMI TAKESHI

Integrated circuit chip stack employing carbon nanotube interconnects