Inventor
MERCALDI GARRY ANTHONY
US22 patents
Patents
22 patentsUS6410968B1Jun 25, 2002
Semiconductor device with barrier layer
MICRON TECHNOLOGY INC31 citations96
US7245010B2Jul 17, 2007
System and device including a barrier layer
MICRON TECHNOLOGY INC20 citations92
US6537677B1Mar 25, 2003
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC13 citations92
US6475883B2Nov 5, 2002
Method for forming a barrier layer
MICRON TECHNOLOGY INC29 citations92
US6471780B1Oct 29, 2002
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC21 citations92
US6521544B1Feb 18, 2003
Method of forming an ultra thin dielectric film
MICRON TECHNOLOGY INC17 citations88
US7651956B1Jan 26, 2010
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC3 citations74
US7060514B2Jun 13, 2006
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC4 citations74
US6833280B1Dec 21, 2004
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC5 citations74
US6774443B2Aug 10, 2004
System and device including a barrier layer
MICRON TECHNOLOGY INC3 citations74
US6680229B2Jan 20, 2004
Method for enhancing vertical growth during the selective formation of silicon, and structures formed using same
MICRON TECHNOLOGY INC10 citations74
US6670231B2Dec 30, 2003
Method of forming a dielectric layer in a semiconductor device
MICRON TECHNOLOGY INC10 citations74
US6649278B2Nov 18, 2003
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC7 citations74
US6576964B1Jun 10, 2003
Dielectric layer for a semiconductor device having less current leakage and increased capacitance
MICRON TECHNOLOGY INC4 citations74
US6837938B2Jan 4, 2005
Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
MICRON TECHNOLOGY INC2 citations63
US7193273B2Mar 20, 2007
Method for enhancing vertical growth during the selective formation of silicon, and structures formed using same
MICRON TECHNOLOGY INC1 citations52
US7095088B2Aug 22, 2006
System and device including a barrier layer
MICRON TECHNOLOGY INC0 citations52
US6998356B2Feb 14, 2006
Method of fabricating a semiconductor device including a dielectric layer formed using a reactive agent
MICRON TECHNOLOGY INC0 citations52
US6960264B2Nov 1, 2005
Process for fabricating films of uniform properties on semiconductor devices
MICRON TECHNOLOGY INC0 citations52
US6770574B2Aug 3, 2004
Method of forming a dielectric layer
MICRON TECHNOLOGY INC0 citations52
US7535047B2May 19, 2009
Semiconductor device containing an ultra thin dielectric film or dielectric layer
MICRON TECHNOLOGY INC0 citations48
US6821838B2Nov 23, 2004
Method of forming an ultra thin dielectric film and a semiconductor device incorporating the same
MICRON TECHNOLOGY INC0 citations48