Inventor
SU CHIN-TA
TW34 patents
⚠️ This page may combine multiple inventors who share the name “SU CHIN-TA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
22 patentsUS8047899B2Nov 1, 2011
Pad and method for chemical mechanical polishing
MACRONIX INT CO LTD25 citations92
US6624023B1Sep 23, 2003
Method for improving the performance of flash memory
MACRONIX INT CO LTD24 citations90
US7157331B2Jan 2, 2007
Ultraviolet blocking layer
MACRONIX INT CO LTD9 citations73
US6855617B1Feb 15, 2005
Method of filling intervals and fabricating shallow trench isolation structures
MACRONIX INT CO LTD6 citations62
US6627501B2Sep 30, 2003
Method of forming tunnel oxide layer
MACRONIX INT CO LTD2 citations62
US7341910B2Mar 11, 2008
Method for forming a flash memory by using a microcrystalline polysilicon layer as a floating gate
MACRONIX INT CO LTD4 citations61
US7314813B2Jan 1, 2008
Methods of forming planarized multilevel metallization in an integrated circuit
MACRONIX INT CO LTD5 citations61
US8034691B2Oct 11, 2011
HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system
MACRONIX INT CO LTD0 citations51
US7659167B2Feb 9, 2010
Method for improving the performance of flash memory by using microcrystalline silicon film as a floating gate
MACRONIX INT CO LTD0 citations51
US7625819B2Dec 1, 2009
Interconnection process
MACRONIX INT CO LTD0 citations51
US7235496B2Jun 26, 2007
HDPCVD process and method for improving uniformity of film thickness
MACRONIX INT CO LTD1 citations51
US6699796B2Mar 2, 2004
Single chip pad oxide layer growth process
MACRONIX INT CO LTD0 citations51
US7144824B2Dec 5, 2006
Method for controlling the properties of DARC and manufacturing DARC
MACRONIX INT CO LTD0 citations50
US7755197B2Jul 13, 2010
UV blocking and crack protecting passivation layer
MACRONIX INT CO LTD1 citations49
US7662712B2Feb 16, 2010
UV blocking and crack protecting passivation layer fabricating method
MACRONIX INT CO LTD1 citations49
US9070634B1Jun 30, 2015
Semiconductor device comprising a surface portion implanted with nitrogen and fluorine
MACRONIX INT CO LTD0 citations47
US9685373B2Jun 20, 2017
Conductive plug and method of forming the same
MACRONIX INT CO LTD0 citations46
US9252102B2Feb 2, 2016
Semiconductor structure and method for manufacturing the same
MACRONIX INT CO LTD0 citations46
US7763517B2Jul 27, 2010
Method of forming non-volatile memory cell
MACRONIX INT CO LTD0 citations45
US9431287B2Aug 30, 2016
Chemical mechanical planarization process and structures
MACRONIX INT CO LTD0 citations41
US7846835B2Dec 7, 2010
Contact barrier layer deposition process
MACRONIX INT CO LTD0 citations41
US7786023B2Aug 31, 2010
Metal pad formation method and metal pad structure using the same
MACRONIX INT CO LTD0 citations40
LUOH TUUNG
6 patentsUS8519541B2Aug 27, 2013
Semiconductor device having plural conductive layers disposed within dielectric layer
LUOH TUUNG0 citations51
US8085390B2Dec 27, 2011
Multivariate monitoring method for plasma process machine
LUOH TUUNG0 citations50
US8520194B2Aug 27, 2013
Method of forming a deposited material by utilizing a multi-step deposition/etch/deposition (D/E/D) process
LUOH TUUNG0 citations48
US8580680B2Nov 12, 2013
Metal silicide formation
LUOH TUUNG0 citations47
US8828861B2Sep 9, 2014
Method for fabricating conductive lines of a semiconductor device
LUOH TUUNG0 citations38
US8184288B2May 22, 2012
Method of depositing a silicon-containing material by utilizing a multi-step fill-in process in a deposition machine
LUOH TUUNG0 citations38