Inventor
BUCCHIGNANO JAMES J
US11 patents
Patents
11 patentsUS6043003AMar 28, 2000
E-beam application to mask making using new improved KRS resist system
IBM45 citations96
US6037097AMar 14, 2000
E-beam application to mask making using new improved KRS resist system
IBM50 citations96
US6251569B1Jun 26, 2001
Forming a pattern of a negative photoresist
IBM23 citations91
US6617086B2Sep 9, 2003
Forming a pattern of a negative photoresist
IBM5 citations72
US7695897B2Apr 13, 2010
Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer
IBM6 citations62
US7659050B2Feb 9, 2010
High resolution silicon-containing resist
IBM3 citations58
US7994639B2Aug 9, 2011
Microelectronic structure including dual damascene structure and high contrast alignment mark
IBM2 citations56
US8029975B2Oct 4, 2011
Fused aromatic structures and methods for photolithographic applications
IBM0 citations52
US7566527B2Jul 28, 2009
Fused aromatic structures and methods for photolithographic applications
IBM1 citations52
US7399573B2Jul 15, 2008
Method for using negative tone silicon-containing resist for e-beam lithography
IBM1 citations48
US7893549B2Feb 22, 2011
Microelectronic lithographic alignment using high contrast alignment mark
IBM1 citations42