Inventor
HOLSCHER RICHARD D
US20 patents
Patents
20 patentsUS6423474B1Jul 23, 2002
Use of DARC and BARC in flash memory processing
MICRON TECHNOLOGY INC272 citations98
US7538036B2May 26, 2009
Methods of forming openings, and methods of forming container capacitors
MICRON TECHNOLOGY INC36 citations92
US7408265B2Aug 5, 2008
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
MICRON TECHNOLOGY INC28 citations92
US7321149B2Jan 22, 2008
Capacitor structures, and DRAM arrays
MICRON TECHNOLOGY INC34 citations92
US7153778B2Dec 26, 2006
Methods of forming openings, and methods of forming container capacitors
MICRON TECHNOLOGY INC34 citations92
US6815308B2Nov 9, 2004
Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates
MICRON TECHNOLOGY INC16 citations92
US6432591B1Aug 13, 2002
Overlay target design method with pitch determination to minimize impact of lens aberrations
MICRON TECHNOLOGY INC14 citations92
US6107002AAug 22, 2000
Reducing resist shrinkage during device fabrication
MICRON TECHNOLOGY INC19 citations92
US6335531B1Jan 1, 2002
Modification of resist and/or resist processing with fluorescence detection
MICRON TECHNOLOGY INC16 citations79
US6756167B2Jun 29, 2004
Overlay target design method to minimize impact of lens aberrations
MICRON TECHNOLOGY INC4 citations73
US6469775B1Oct 22, 2002
Reticle for creating resist-filled vias in a dual damascene process
MICRON TECHNOLOGY INC5 citations73
US6417076B1Jul 9, 2002
Automated combi deposition apparatus and method
MICRON TECHNOLOGY INC10 citations72
US6403285B1Jun 11, 2002
Method for exposing semiconductor wafers in a manner that promotes radial processing uniformity
MICRON TECHNOLOGY INC9 citations72
US6639320B2Oct 28, 2003
Reticle for creating resist-filled vias in a dual damascene process
MICRON TECHNOLOGY INC2 citations62
US6514643B2Feb 4, 2003
Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrations
MICRON TECHNOLOGY INC1 citations62
US6461778B1Oct 8, 2002
In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems
MICRON TECHNOLOGY INC2 citations62
US6768213B2Jul 27, 2004
Automated combi deposition apparatus and method
MICRON TECHNOLOGY INC3 citations61
US7821142B2Oct 26, 2010
Intermediate semiconductor device structures
MICRON TECHNOLOGY INC0 citations52
US6812129B2Nov 2, 2004
Reticle for creating resist-filled vias in a dual damascene process
MICRON TECHNOLOGY INC0 citations52
US6580493B2Jun 17, 2003
Method and apparatus for exposing semiconductor wafers in a manner that promotes radial processing uniformity
MICRON TECHNOLOGY INC0 citations51