Inventor

MORIYA TSUYOSHI

JP106 patents

⚠️ This page may combine multiple inventors who share the name “MORIYA TSUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MORIYA TSUYOSHI

TOKYO ELECTRON LTD

Particle removal apparatus and method and plasma processing apparatus

Internal member of a plasma processing vessel

Particle removal apparatus and method and plasma processing apparatus

Substrate processing system, substrate processing method, and storage medium

Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring

Gas supply member and plasma processing apparatus

Substrate processing apparatus and substrate transferring method

Internal member of a plasma processing vessel

Plasma processing apparatus, ring member and plasma processing method

Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium

Substrate cleaning apparatus and method

Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program

Processing apparatus and method for removing particles therefrom

Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component

Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus

Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium

Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program

Plasma processing method

Vapor-phase processing method capable of eliminating particle formation

Gate valve cleaning method and substrate processing system

Turbo-molecular pump, substrate processing apparatus, and method for suppressing attachment of depositions to turbo-molecular pump

Gate valve cleaning method and substrate processing system

Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method

Particle monitor system and substrate processing apparatus

Charging method for semiconductor device manufacturing apparatus, storage medium storing program for implementing the charging method, and semiconductor device manufacturing apparatus implementing the charging method

Cleaning apparatus and cleaning method

Particle monitor system and substrate processing apparatus

Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring

Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the program

Apparatus for inspecting a surface of an object to be processed

MORIYA TSUYOSHI

Component cleaning method and storage medium

Method for cleaning elements in vacuum chamber and apparatus for processing substrates

Gas purification apparatus and method

Method for cleaning elements in vacuum chamber and apparatus for processing substrates

Particle sticking prevention apparatus and plasma processing apparatus

Method of manufacturing semiconductor devices and semiconductor manufacturing apparatus

Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium

Method for cleaning elements in vacuum chamber and apparatus for processing substrates

NEC CORP

Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles

Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles

Apparatus for monitoring particles and method of doing the same

System and method for detecting particles produced in a process chamber by scattering light

SAMSUNG ELECTRONICS CO LTD

Imaging apparatus, imaging method, and computer program product

Image white balance correction method and electronic device

Image processing apparatus and image processing method

Image processing apparatus and method

NEC ELECTRONICS CORP

Apparatus and method for detecting an end point of a cleaning process

Particle-removing method for a semiconductor device manufacturing apparatus

YAMAWAKU JUN

Substrate transfer module and substrate processing system

MITSUHASHI KOUJI

Internal member of a plasma processing vessel