Inventor
NAGAIKE HIROSHI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “NAGAIKE HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
13 patentsUS8052798B2Nov 8, 2011
Particle removal apparatus and method and plasma processing apparatus
TOKYO ELECTRON LTD47 citations98
US7780786B2Aug 24, 2010
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD51 citations98
US7651586B2Jan 26, 2010
Particle removal apparatus and method and plasma processing apparatus
TOKYO ELECTRON LTD52 citations98
US8877002B2Nov 4, 2014
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD7 citations84
US8043971B2Oct 25, 2011
Plasma processing apparatus, ring member and plasma processing method
TOKYO ELECTRON LTD13 citations84
US7756599B2Jul 13, 2010
Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program
TOKYO ELECTRON LTD10 citations83
US7347006B2Mar 25, 2008
Processing apparatus and method for removing particles therefrom
TOKYO ELECTRON LTD9 citations83
US10643825B2May 5, 2020
Particle generation preventing method and vacuum apparatus
TOKYO ELECTRON LTD5 citations71
US11158490B2Oct 26, 2021
Processing method in processing apparatus using halogen-based gas
TOKYO ELECTRON LTD2 citations64
US7976637B2Jul 12, 2011
Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
TOKYO ELECTRON LTD3 citations63
US7560083B2Jul 14, 2009
Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the program
TOKYO ELECTRON LTD6 citations63
US11462444B2Oct 4, 2022
Substrate container, controller, and abnormality detection method
TOKYO ELECTRON LTD1 citations62
US10895014B2Jan 19, 2021
Processing method and processing apparatus of metal member
TOKYO ELECTRON LTD0 citations62
MORIYA TSUYOSHI
7 patentsUS8337629B2Dec 25, 2012
Method for cleaning elements in vacuum chamber and apparatus for processing substrates
MORIYA TSUYOSHI7 citations84
US8137473B2Mar 20, 2012
Method for cleaning elements in vacuum chamber and apparatus for processing substrates
MORIYA TSUYOSHI7 citations84
US8608422B2Dec 17, 2013
Particle sticking prevention apparatus and plasma processing apparatus
MORIYA TSUYOSHI7 citations83
US8206513B2Jun 26, 2012
Method for cleaning elements in vacuum chamber and apparatus for processing substrates
MORIYA TSUYOSHI2 citations63
US8323414B2Dec 4, 2012
Particle removal apparatus and method and plasma processing apparatus
MORIYA TSUYOSHI0 citations52
US9627184B2Apr 18, 2017
Cleaning method of processing apparatus, program for performing the method, and storage medium for storing the program
MORIYA TSUYOSHI0 citations42
US8243265B2Aug 14, 2012
Method and apparatus for detecting foreign materials and storage medium
MORIYA TSUYOSHI0 citations38
NAGAIKE HIROSHI
2 patentsUS8531664B2Sep 10, 2013
Particle number measurement method
NAGAIKE HIROSHI2 citations58
US8578952B2Nov 12, 2013
Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
NAGAIKE HIROSHI0 citations48