Inventor
INABA SHOGO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “INABA SHOGO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
20 patentsUS7709912B2May 4, 2010
Electronic device and method for manufacturing thereof
SEIKO EPSON CORP17 citations93
US7696587B2Apr 13, 2010
MEMS device having a movable electrode
SEIKO EPSON CORP11 citations93
US7671430B2Mar 2, 2010
MEMS resonator and manufacturing method of the same
SEIKO EPSON CORP13 citations93
US7994594B2Aug 9, 2011
Electronic device, resonator, oscillator and method for manufacturing electronic device
SEIKO EPSON CORP16 citations92
US7956709B2Jun 7, 2011
MEMS switch and manufacturing method thereof
SEIKO EPSON CORP13 citations84
US7880245B2Feb 1, 2011
Electronic device and method for manufacturing thereof
SEIKO EPSON CORP11 citations84
US7838952B2Nov 23, 2010
MEMS device and fabrication method thereof
SEIKO EPSON CORP10 citations84
US7656252B2Feb 2, 2010
Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof
SEIKO EPSON CORP9 citations84
US8026120B2Sep 27, 2011
Method of manufacturing MEMS device
SEIKO EPSON CORP19 citations83
US7989905B2Aug 2, 2011
MEMS device having a movable electrode
SEIKO EPSON CORP4 citations74
US7884431B2Feb 8, 2011
MEMS device having a movable electrode
SEIKO EPSON CORP5 citations74
US6479342B1Nov 12, 2002
Semiconductor devices and manufacturing methods thereof
SEIKO EPSON CORP10 citations74
US8018302B2Sep 13, 2011
Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof
SEIKO EPSON CORP1 citations63
US9154109B2Oct 6, 2015
Vibrator, oscillator, electronic apparatus, moving object, and method of manufacturing vibrator
SEIKO EPSON CORP3 citations62
US11679976B2Jun 20, 2023
Structure forming method and device
SEIKO EPSON CORP0 citations52
US8362577B2Jan 29, 2013
Resonator including a microelectromechanical system structure with first and second structures of silicon layers
SEIKO EPSON CORP0 citations52
US7892875B2Feb 22, 2011
MEMS resonator and manufacturing method of the same
SEIKO EPSON CORP0 citations52
US6897481B2May 24, 2005
Semiconductor devices and manufacturing methods thereof
SEIKO EPSON CORP0 citations52
US9176013B2Nov 3, 2015
Sensor, electronic apparatus, robot, and mobile object
SEIKO EPSON CORP0 citations51
US10761109B2Sep 1, 2020
Physical quantity sensor, inertia measurement device, vehicle positioning device, portable electronic apparatus, electronic apparatus, and vehicle
SEIKO EPSON CORP0 citations49
INABA SHOGO
8 patentsUS8525277B2Sep 3, 2013
MEMS device
INABA SHOGO3 citations62
US8198957B2Jun 12, 2012
Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof
INABA SHOGO1 citations62
US8129804B2Mar 6, 2012
Electronic device, resonator, oscillator and method for manufacturing electronic device
INABA SHOGO3 citations62
US8063721B2Nov 22, 2011
Micro-electro-mechanical-system (MEMS) resonator and manufacturing method thereof
INABA SHOGO1 citations62
US8760234B2Jun 24, 2014
MEMS vibrator and oscillator
INABA SHOGO0 citations51
US8592925B2Nov 26, 2013
Functional device with functional structure of a microelectromechanical system disposed in a cavity of a substrate, and manufacturing method thereof
INABA SHOGO0 citations51
US8552512B2Oct 8, 2013
MEMS device and fabrication method thereof
INABA SHOGO1 citations51
US8432232B2Apr 30, 2013
MEMS device and oscillator
INABA SHOGO1 citations51
TOKYO ELECTRON LTD
5 patentsUS11065639B2Jul 20, 2021
Coating treatment method, computer storage medium and coating treatment apparatus
TOKYO ELECTRON LTD2 citations72
US12435427B2Oct 7, 2025
Substrate processing method and storage medium
TOKYO ELECTRON LTD0 citations60
US11773492B2Oct 3, 2023
Substrate processing apparatus, substrate processing method, and storage medium
TOKYO ELECTRON LTD0 citations60
US10359702B2Jul 23, 2019
Development processing apparatus, development processing method, and storage medium
TOKYO ELECTRON LTD1 citations60
US11557495B2Jan 17, 2023
Coating film forming method
TOKYO ELECTRON LTD0 citations52